Semiconductor device and method for fabricating the same

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United States of America Patent

PATENT NO 7465618
APP PUB NO 20060281264A1
SERIAL NO

11411932

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Abstract

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A semiconductor device includes: a semiconductor substrate; a gate insulating film formed on the semiconductor substrate and made of a high-dielectric-constant material composed of a plurality of layers stacked perpendicularly to a principal surface of the semiconductor substrate and associated with respective phases; and a gate electrode formed on the gate insulating film.

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Patent Owner(s)

Patent OwnerAddress
IMECKAPELDREEF 75 LEUVEN 3001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Shigenori Nara, JP 84 2359
Yamamoto, Kazuhiko Osaka, JP 147 1220

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