EUV photoresist encapsulation

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United States of America Patent

PATENT NO 8883374
SERIAL NO

13705418

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Abstract

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A method and system are described for performing extreme ultraviolet photolithographic processing. The method comprises obtaining a substrate comprising a hard mask and a patterned layer of extreme ultraviolet (EUV) photoresist formed above the hard mask, encapsulating the patterned layer of EUV photoresist by forming an encapsulating layer being one of a silicon-oxide, silicon-nitride, silicon-oxynitride, germanium-oxide, germanium-nitride, germanium-oxynitride, silicongermanium-oxide, silicongermanium-nitride, silicongermanium-oxynitride layer on the photoresist and dry etching of the substrate for patterning the hard mask. The encapsulation layer thereby is formed at a temperature below the weakening temperature Tg of the EUV photoresist by using a first precursor being one of the group of silicon-tetrahalogenide, silicon tetrahydride, germanium-tetrahalogenide, germanium tetrahydride, silicongermanium-tetrahalogenide or silicongermanium tetrahydride precursor and an oxygen precursor.

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Patent Owner(s)

Patent OwnerAddress
IMECKAPELDREEF 75 LEUVEN 3001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Altamirano, Sanchez Efrain Kessel-lo, BE 9 8

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