Integrated inductor and integrated inductor fabricating method

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United States of America Patent

PATENT NO 9252199
APP PUB NO 20140284762A1
SERIAL NO

14203474

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Abstract

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The present invention provides an integrated inductor and an integrated inductor fabricating method. The integrated inductor comprises: a semiconductor substrate, a plurality of deep trenches, and an inductor. The deep trenches are formed in the semiconductor substrate and arranged in a specific pattern, and the deep trenches are filled with a metal material to form a patterned ground shield (PGS). The inductor is formed above the semiconductor substrate. The integrated inductor fabricating method comprises: forming a semiconductor substrate; forming a plurality of deep trenches in the semiconductor substrate and arranging the deep trenches in a specific pattern; filling the deep trenches with a metal material to form a patterned ground shield (PGS); and forming an inductor above the semiconductor substrate.

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Patent Owner(s)

Patent OwnerAddress
REALTEK SEMICONDUCTOR CORP2 INNOVATION RD II SCIENCE PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yeh, Ta-Hsun Hsinchu, TW 84 404

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