FinFET device and method for manufacturing the same

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United States of America Patent

PATENT NO 9391073
APP PUB NO 20150311200A1
SERIAL NO

14397822

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Abstract

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A FinFET device and a method for manufacturing the same. The FinFET device includes a plurality of fins each extending in a first direction on a substrate; a plurality of gate stacks each being disposed astride the plurality of fins and extending in a second direction; a plurality of source/drain region pairs, respective source/drain regions of each source/drain region pair being disposed on opposite sides of the each gate stack in the second direction; and a plurality of channel regions each comprising a portion of a corresponding fin between the respective source/drain regions of a corresponding source/drain pair, wherein the each fin comprises a plurality of protruding cells on opposite side surfaces in the second direction.

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Patent Owner(s)

Patent OwnerAddress
INSTITUTE OF MICROELECTRONICS CHINESE ACADEMY OF SCIENCES100029 BEIJING CITY CHAOYANG DISTRICT BEITUCHENG WEST ROAD NO 3 BEIJING CITY BEIJING CITY 100029

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ma, Xiaolong Beijing, CN 60 749
Xu, Qiuxia Beijing, CN 62 570
Xu, Weijia Beijing, CN 2 24
Yin, Huaxiang Beijing, CN 120 1989
Zhu, Huilong Poughkeepsie, US 690 12414

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