GRAVURE CYLINDER-USE COPPER PLATING METHOD AND DEVICE

World Intellectual Property Organization Patent

APP PUB NO WO-2006126518-A1
SERIAL NO

PCTJP2006310209

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Abstract

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Gravure cylinder-use copper plating method and device which can perform a uniform-thickness copper plating on a gravure cylinder over its entire length without causing defects such as rashes and pits regardless of the size of a gravure cylinder, can automatically control the concentration of copper plating solution, reduce the consumption of an additive, enable a short-time plating treatment, reduce power supply costs, and are easy to handle with good visibility. A hollow cylindrical gravure cylinder is gripped at the opposite longitudinal-direction ends, is placed in a plating tank filled with copper plating solution, and is energized so as to function as a cathode while rotated at a specified speed; a pair of long-box anode chambers that are vertically suspended slidably on the opposite sides of the gravure cylinder in the plating tank and incorporate insoluble anodes so energized as to function as anodes are allowed to come close to the opposite side surfaces of the gravure cylinder with specified intervals; and the outer peripheral surface of the gravure cylinder is copper plated.

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Patent Owner(s)

Patent OwnerAddress
THINK LABS KKJP

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Inventor(s)

Inventor Name Address
INOUE MANABU 〒2700128 千葉県流山市おおたかの森西3-1-4 ディップソール株式会社 おおたかの森テクニカルセンター内 CHIBA ?2700128
MATSUMOTO NORIKO KYOTO

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