RETICLE HOLDING MEMBER, RETICLE STAGE, EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

World Intellectual Property Organization Patent

APP PUB NO WO-2008007521-A1
SERIAL NO

PCTJP2007062229

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Abstract

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Provided is a reticle holding member, which does not drop a reticle from a reticle stage even when power supply is interrupted and maintains planarity of a surface whereupon a pattern is formed. A reticle holding member (101) for holding a reticle (100) is characterized in that at least a part of the peripheral portion is protruded from the reticle, and the reticle holding member is attached by permitting the protruded peripheral portion to be supported by reticle stages (201, 203) of an exposure apparatus.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPJPTOKYO

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Inventor(s)

Inventor Name Address
HIRAYANAGI NORIYUKI TOKYO

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