SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
World Intellectual Property Organization Patent
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Abstract
Disclosed is a layout structure for semiconductor integrated circuit devices, which can prevent thinning or disconnection of a metal wiring near a cell boundary without accompanying an increase in the data amount or processing time for OPC. A first cell and a second cell, each having a transistor and an internal wiring for performing a circuit function, are arranged adjacent to each other in a first direction in a region lying between a source wiring (m1) and a ground wiring (m2) which are so arranged as to extend in the first direction. In the boundary portion between the first cell and the second cell, a metal wiring (d2) extending in a second direction, which is perpendicular to the first direction, is arranged so that the metal wiring (d2) is not short-circuited with the source wiring (m1) and the ground wiring (m2).
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- 10 France
- 8 Japan
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- 5 Korea
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Patent Owner(s)
| Patent Owner | Address |
|---|---|
| PANASONIC CORPORATION | JP1006 OAZA KADOMA KADOMA-SHI OSAKA 571-8501 |
International Classification(s)
Inventor(s)
| Inventor Name | Address |
|---|---|
| NISHIMURA HIDETOSHI | - |
| TANIGUCHI HIROKI | 406-3 TSUICHIBA ABOSHI-KU HIMEJI-SHI HYOGO |
| SHIMBO HIROYUKI | - |
| TOUBOU TETSUROU | - |
| YONEDA HISAKO | - |
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