POLYURETHANE COMPOSITION FOR CMP PADS AND METHOD OF MANUFACTURING SAME

World Intellectual Property Organization Patent

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Feb 10, 2011
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Jul 16, 2010
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Aug 7, 2009

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Abstract

Polyurethane composition based on a certain polyether and polyester prepolymer reaction mixture, wherein the composition is utilized in manufacturing chemical mechanical polishing/planarizing (CMP) pads. The CMP pads have low rebound and can dissipate irregular energy as well as stabilize polishing to yield improved uniformity and less dishing of the substrate.

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PRAXAIR TECHNOLOGY INC	USCONNECTICUT USA CONNECTICUT

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Inventor Name	Address
HUANG DAVID	C/O CAPITAL ONE SERVICES LLC 1680 CAPITAL ONE DRIVE MCLEAN VIRGINIA 22102 22102
ZHANG YONG	WEST WINDSOR NJ
SUN LU	451 VILLAGE COMMONS LANE APEX NORTH CAROLINA 27502 27502

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2011016971

POLYURETHANE COMPOSITION FOR CMP PADS AND METHOD OF MANUFACTURING SAME

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POLYURETHANE COMPOSITION FOR CMP PADS AND METHOD OF MANUFACTURING SAME

World Intellectual Property Organization Patent

PCTUS2010042281

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PCTUS2010042281

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