POLYAMIDE COMPOSITION FOR LOW TEMPERATURE APPLICATIONS
World Intellectual Property Organization Patent
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Abstract
A polyamide composition is formed from a low viscosity polyamide-6 and a nucleating agent. The nucleating agent includes an organic material, a first inorganic material and a second inorganic material. Suitable organic materials include organic polymers. Suitable inorganic metallic materials include metal oxides and silicates. The polyamide composition may include polyamide-66 materials and carbon black.

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Patent Owner(s)
Patent Owner | Address |
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HONEYWELL INT INC | USNEW JERSEY USA |
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- [Classification Symbol]
- [Patents Count]
Inventor(s)
Inventor Name | Address |
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WANG LEI | GUANGDONG 518129 |
PENG SHUWEN | SHANGHAI 200135 |
WEI JIE | 中国北京市海淀区双榆树大泥湾3号楼2门201号 BEIJING 100089 100089 |
HUANG JIANFENG | 中国福建省泉州市晋江市经济开发区(五里园)裕源路10号-1至-2 362200 362200 |
YUAN JIAYU | SHANGHAI |
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