PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE

World Intellectual Property Organization Patent

APP PUB NO WO-2015159821-A1
SERIAL NO

PCTJP2015061251

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Abstract

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　Provided are: a photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, that has low cytotoxicity, and that can form a cell culture substrate with which cells can be cultured well; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition.　In the photosensitive resin composition, which includes a photopolymerizible monomer (A) and a photopolymerization initiator (B), the photopolymerizible monomer (A) used contains a defined amount of a polyfunctional monomer (A1) that is at least trifunctional, and the content of the photopolymerization initiator (B) is within a prescribed range.

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTDJPKANAGAWA KANAGAWA

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Inventor(s)

Inventor Name Address
SENZAKI TAKAHIRO KAWASAKI-SHI KANAGAWA 211-0012

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