COMPOSITION FOR POLISHING, POLISHING METHOD AND METHOD FOR PRODUCING HARD-BRITTLE MATERIAL SUBSTRATE

World Intellectual Property Organization Patent

APP PUB NO WO-2016136177-A1
SERIAL NO

PCTJP2016000748

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Abstract

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A composition for polishing, which is used for polishing of the surface of an object to be polished, said surface containing an oxide of a metal or a semimetal or a composite material of these oxides, and which contains at least water and silica. This composition for polishing is characterized in that: the silica contains small-diameter silica particles having particle diameters of from 20 nm to 70 nm (inclusive) and large-diameter silica particles having particle diameters of from 100 nm to 200 nm (inclusive); the small-diameter silica particles are contained in the composition for polishing in an amount of 2% by weight or more; the large-diameter silica particles are contained in the composition for polishing in an amount of 2% by weight or more; and the value obtained by dividing the average particle diameter of the large-diameter silica particles by the average particle diameter of the small-diameter silica particles is 2 or more.

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Patent Owner(s)

Patent OwnerAddress
FUJIMI INCJPJAPAN

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Inventor(s)

Inventor Name Address
ASAI MAIKO KIYOSU
SERIKAWA MASAYUKI KIYOSU-SHI
AKIYAMA TOMOMI KIYOSU-SHI AICHI
TENKOU KYOUSUKE KIYOSU-SHI AICHI 452-8502

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