SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS

World Intellectual Property Organization Patent

APP PUB NO WO-2017196167-A1
SERIAL NO

PCTNL2017050287

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Abstract

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Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

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Patent Owner(s)

Patent OwnerAddress
STAMICARBONNL

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Inventor(s)

Inventor Name Address
DIRKX WILFRIED MARC RENAAT 6135 KW SITTARD
COLOMA GONZÁLEZ JUAN 6135 KW SITTARD
HIGGINS BRIAN SAYRE 6135 KW SITTARD
TATE III JOHN MARSHALL 6135 KW SITTARD
YATES ROBERT ARTHUR 6135 KW SITTARD
POMERLEAU MARCEL JULIEN 6135 KW SITTARD
HEON JON MICHAEL 6135 KW SITTARD

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