FABRICATING UNIQUE CHIPS USING A CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM

World Intellectual Property Organization Patent

APP PUB NO WO-2018047985-A1
SERIAL NO

PCTJP2017033371

Stats

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
MAPPER LITHOGRAPHY IP BVNL

International Classification(s)

Inventor(s)

Inventor Name Address
WIELAND MARCO JAN-JACO DELFT
KUIPER VINCENT SYLVESTER THE HAGUE
VAN KERVINCK MARCEL NICOLAAS JACOBUS THE HAGUE

Cited Art Landscape

Load Citation