POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

World Intellectual Property Organization Patent

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Apr 22, 2021
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Oct 6, 2020
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Oct 15, 2019

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Abstract

A polishing composition includes an abrasive; an optional pH adjuster; a barrier film removal rate enhancer; a TEOS removal rate inhibitor; a cobalt removal rate enhancer; an azole-containing corrosion inhibitor; and a cobalt corrosion inhibitor.

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FUJIFILM ELECTRONIC MAT USA INC	US

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HU BIN	LOS ALTOS CA
WEN LIQING	MESA ARIZONA 85215
CHANG SHU-WEI	TAOYUAN DIST TAOYUAN CITY 330
LIANG YANNAN	GILBERT AZ

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2021076352

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

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POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

World Intellectual Property Organization Patent

PCTUS2020054371

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PCTUS2020054371

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Full Text

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