PROTECTION OF OPTICAL MATERIALS OF OPTICAL COMPONENTS FROM RADIATION DEGRADATION
World Intellectual Property Organization Patent
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Abstract
An optical system includes a bulk material including a fluorine (F)-containing optical material. The bulk material is exposed to an environment at a pressure ranging from atmospheric to vacuum when the bulk material is under extreme ultra-violet (EUV), vacuum ultra-violet (VUV), deep ultra-violet (DUV) and/or UV radiation. The environment includes at least one type of gas or vapor. The at least one type of gas or vapor includes polar molecules.

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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
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Patent Owner(s)
Patent Owner | Address |
---|---|
KLA CORP | USONE TECHNOLOGY DRIVE MILPITAS CALIFORNIA 95035 US |
International Classification(s)
Inventor(s)
Inventor Name | Address |
---|---|
CHEN GRACE | LIBERTYVILLE IL |
DERSTINE MATTHEW | LOS GATOS CA |
DELGADO GILDARDO | 5945 LINWOOD CMN LIVERMORE CALIFORNIA 4550 4550 |
SAVEE JOHN | SAN FRANCISCO 94131 |
BUTAEVA EVGENIIA | 185 ESTANCIA DRIVE APT 329 SAN JOSE CALIFORNIA 95134 95134 |
ZHUANG GUORONG | 2782 BARCLAY WAY ANN ARBOR MICHIGAN 48105 48105 |
LOPEZ LOPEZ GARY | C/O NOVA MEASURING INSTRUMENTS INC 3342 GATEWAY BLVD FREMONT CALIFORNIA 94538 94538 |
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