CLEANING COMPOSITIONS AND METHODS OF USE THEREOF

World Intellectual Property Organization Patent

APP PUB NO WO-2022046899-A1
SERIAL NO

PCTUS2021047542

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Abstract

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The present disclosure relates to cleaning compositions that are used to clean semiconductor substrates. These cleaning compositions can remove the defects/contaminants arising from previous processing on the semiconductor substrates and thereby make the substrates appropriate for further processing. The cleaning compositions described herein primarily contain at least one pH adjusting agent and at least one biosurfactant.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM ELECTRONIC MAT USA INCUS

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Inventor(s)

Inventor Name Address
TURNER ERIC SOMERVILLE MA
BALLESTEROS CARL SAN TAN VALLEY AZ 85143
SCHAEFER ZACHARY L 9436 EAST EMELITA AVENUE MESA ARIZONA 85208 85208

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