Description
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES
C09G
Technology
Stats
- 1,074 US PATENTS IN FORCE
- 703 US APPLICATIONS PENDING
- 365 Total Patent Owners
- 3,022 TOTAL INVENTORS
Subclasses
| Subclass | Title |
|---|---|
| 1/00 | Polishing compositions (French polish C09F 11/00; detergents C11D) |
| 1/02 | Polishing compositions (French polish C09F 11/00; detergents C11D) containing abrasives or grinding agents |
| 1/04 | Polishing compositions (French polish C09F 11/00; detergents C11D) Aqueous dispersions (C09G 1/02 takes precedence) |
| 1/06 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions |
| 1/08 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on wax |
| 1/10 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on wax based on mixtures of wax and natural or synthetic resin |
| 1/12 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on wax based on mixtures of wax and natural or synthetic resin mixtures of wax and silicon-containing polycondensates |
| 1/14 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on non-waxy substances |
| 1/16 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on non-waxy substances on natural or synthetic resins |
| 1/18 | Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on non-waxy substances on other substances |
| 3/00 | Ski waxes |
Recent Patents
Not Available
Recent Publications
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2025/0115,785 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAME | Jul 12, 24 | Apr 10, 25 | Samsung Electronics Co. Ltd.; SOULBRAIN CO., LTD; |
| 2025/0115,786 | POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAME | Sep 30, 24 | Apr 10, 25 | SK enpulse Co., Ltd. |
| 2025/0115,787 | POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAME | Sep 30, 24 | Apr 10, 25 | SK enpulse Co., Ltd. |
| 2025/0112,050 | POLISHING APPARATUS HAVING BEAM FOR SURFACE TREATMENT AND POLISHING METHOD USING THE SAME | Sep 28, 23 | Apr 03, 25 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 2025/0109,317 | POLISHING COMPOSITION | Jul 25, 24 | Apr 03, 25 | Fujimi Incorporated |
| 2025/0109,319 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | Sep 20, 24 | Apr 03, 25 | Fujimi Incorporated |
| 2025/0109,318 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE | Aug 29, 24 | Apr 03, 25 | Fujimi Incorporated |
Top Owners in This Class
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Applications Filed in This Class - By Year
Patents Issued To Date - By Filing Year
Average Time to Issuance
- 34 Months (last 2 years Issuances)
- 34 Months (last 5 years Issuances)