Class C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES
Subclass 1/16: Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on non-waxy substances on natural or synthetic resins
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 12252634 | Polyurethane for polishing layers, polishing layer and polishing pad | Sep 03, 19 | Mar 18, 25 | Kuraray Co. Ltd. |
| 12138736 | Polishing pad sheet, polishing pad, and method for manufacturing semiconductor device | Dec 07, 21 | Nov 12, 24 | SK ENPULSE CO., LTD. |
| 11970632 | Use of sulfonic acids in dry electrolytes to polish metal surfaces through ion transport | Dec 30, 20 | Apr 30, 24 | DRYLYTE, S.L. |
| 11970633 | Use of sulfonic acids in dry electrolytes to polish metal surfaces through ion transport | Feb 28, 22 | Apr 30, 24 | DRYLYTE, S.L. |
| 11745302 | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process | Mar 22, 21 | Sep 05, 23 | APPLIED MATERIALS, INC. |
| 11749531 | Polishing method, and polishing composition and method for producing the same | Sep 06, 18 | Sep 05, 23 | FUJIMI INCORPORATED |
| 11401442 | Polishing liquid and chemical mechanical polishing method | Jul 23, 20 | Aug 02, 22 | FUJIFILM Corporation |
| 11214711 | Polishing composition, method for producing same, and polishing method | May 06, 16 | Jan 04, 22 | Shin-Etsu Chemical Co. Ltd. |
| 11179822 | Polyurethane polishing layer, polishing pad comprising polishing layer, method for preparing polishing layer and method for planarizing material | Aug 31, 18 | Nov 23, 21 | HUBEI DINGHUI MICROELECTRONICS MATERIALS CO., LTD |
| 11164738 | Compositions and methods for removing ceria particles from a surface | Jan 18, 18 | Nov 02, 21 | Entegris, Inc. |
| 11084143 | Correction of fabricated shapes in additive manufacturing using modified edge | Jan 17, 18 | Aug 10, 21 | Applied Materials Inc. |
| 11059149 | Correction of fabricated shapes in additive manufacturing using initial layer | Jan 17, 18 | Jul 13, 21 | Applied Materials Inc. |
| 11015082 | Crack-resistant polysiloxane dielectric planarizing compositions, methods and films | Dec 05, 18 | May 25, 21 | Honeywell International, Inc. |
| 10995239 | Polishing fluid for improving surfaces formed by fused deposition molding with abs and method of preparing same | May 29, 20 | May 04, 21 | Shaanxi University of Technology |
| 10953515 | Apparatus and method of forming a polishing pads by use of an additive manufacturing process | Nov 16, 16 | Mar 23, 21 | APPLIED MATERIALS, INC. |
| 10947412 | Crack-resistant silicon-based planarizing compositions, methods and films | Dec 05, 18 | Mar 16, 21 | Honeywell International, Inc. |
| 10882160 | Correction of fabricated shapes in additive manufacturing using sacrificial material | Jan 17, 18 | Jan 05, 21 | Applied Materials Inc. |
| 10876020 | Polishing additive composition, polishing slurry composition and method for polishing insulating film of semiconductor element | Dec 20, 18 | Dec 29, 20 | Not available |
| 10822525 | Polishing composition and method for polishing magnetic disk substrate | Mar 26, 18 | Nov 03, 20 | YAMAGUCHI SEIKEN KOGYO CO., LTD. |
| 10570314 | Polishing agent, polishing method, and liquid additive for polishing | Sep 11, 17 | Feb 25, 20 | AGC Inc. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2024/0417,596 | PLASTIC SOFT COMPOSITION AND SCUFFING PROCESSING METHOD | Jun 18, 24 | Dec 19, 24 | Not available |
| 2024/0254,366 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE | Jan 24, 24 | Aug 01, 24 | Not available |
| 2024/0247,170 | POLYMER NANOPARTICLE AND METHOD OF PREPARING SAME | Jan 10, 24 | Jul 25, 24 | Samsung Electronics Co., Ltd.; POSTECH Research and Business Development Foundation; |
| 2024/0240,053 | USE OF SULFONIC ACIDS IN DRY ELECTROLYTES TO POLISH METAL SURFACES THROUGH ION TRANSPORT | Mar 29, 24 | Jul 18, 24 | Not available |
| 2024/0123,568 | METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING PADS BY USE OF AN ADDITIVE MANUFACTURING PROCESS | Jun 21, 23 | Apr 18, 24 | Not available |
| 2023/0312,983 | POLISHING COMPOSITION, AND POLISHING METHOD USING POLISHING COMPOSITION | Jul 09, 21 | Oct 05, 23 | YAMAGUCHI SEIKEN KOGYO CO., LTD. |
| 2023/0274,936 | PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | Feb 23, 23 | Aug 31, 23 | Shin-Etsu Chemical Co. Ltd. |
| 2022/0325,140 | COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | Mar 29, 22 | Oct 13, 22 | Fujimi Incorporated |
| 2021/0380,845 | POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND METHOD FOR MODIFYING POLISHING LAYER | Nov 01, 19 | Dec 09, 21 | Kuraray Co., Ltd. |
| 2020/0017,719 | COMPOSITION FOR SURFACE TREATMENT, METHOD FOR PRODUCING THE SAME, SURFACE TREATMENT METHOD USING COMPOSITION FOR SURFACE TREATMENT, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | Feb 19, 18 | Jan 16, 20 | Fujimi Incorporated |
| 2019/0284,436 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE | Mar 14, 19 | Sep 19, 19 | JSR Corporation |
| 2018/0215,953 | POLISHING COMPOSITION AND METHOD FOR POLISHING MAGNETIC DISK SUBSTRATE | Mar 26, 18 | Aug 02, 18 | YAMAGUCHI SEIKEN KOGYO CO., LTD. |
| 2018/0134,918 | SOFT POLYMER-BASED MATERIAL POLISHING MEDIA | Nov 09, 17 | May 17, 18 | Not available |
| 2017/0233,608 | Streakless Car Polish | Feb 15, 17 | Aug 17, 17 | Not available |
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