Description
Class C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES
Subclass 1/18: Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions based on non-waxy substances on other substances
C09G 1/18
Sub-Class
Stats
- 29 US PATENTS IN FORCE
- 7 US APPLICATIONS PENDING
- 10 Total Patent Owners
- 107 TOTAL INVENTORS
Recent Patents
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 12221557 | Polishing composition and polishing method | Feb 24, 22 | Feb 11, 25 | FUJIMI INCORPORATED |
| 12023707 | Methods of temporarily enhancing the luster and brilliance of jewelry and gem stones | Apr 14, 23 | Jul 02, 24 | Not available |
| 11970632 | Use of sulfonic acids in dry electrolytes to polish metal surfaces through ion transport | Dec 30, 20 | Apr 30, 24 | DRYLYTE, S.L. |
| 11970633 | Use of sulfonic acids in dry electrolytes to polish metal surfaces through ion transport | Feb 28, 22 | Apr 30, 24 | DRYLYTE, S.L. |
| 11560495 | CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same | Jan 22, 21 | Jan 24, 23 | Samsung SDI Co., Ltd. |
| 11545365 | Chemical planarization | May 13, 20 | Jan 03, 23 | CHEMPOWER CORPORATION |
| 11518913 | Fluid composition and method for conducting a material removing operation | Aug 27, 20 | Dec 06, 22 | Saint-Gobain Ceramics & Plastics, Inc. |
| 11401442 | Polishing liquid and chemical mechanical polishing method | Jul 23, 20 | Aug 02, 22 | FUJIFILM Corporation |
| 11312882 | CMP slurry solution for hardened fluid material | Sep 14, 20 | Apr 26, 22 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 11292938 | Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films | Sep 11, 19 | Apr 05, 22 | Rohm and Haas Electronic Materials CMP Holdings, Inc. |
| 11279852 | CMP slurry compositions and methods of fabricating a semiconductor device using the same | Jun 25, 20 | Mar 22, 22 | Samsung Electronics Co., Ltd.; KCTECH CO.. LTD.; |
| 10858544 | Chemical mechanical polishing slurry and chemical mechanical polishing process using the same | May 24, 18 | Dec 08, 20 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 10774241 | CMP slurry solution for hardened fluid material | Feb 13, 17 | Sep 15, 20 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 10479911 | Composition and method for polishing memory hard disks exhibiting reduced edge roll off | Jun 05, 18 | Nov 19, 19 | Cabot Microelectronics Corporation |
| 10358579 | CMP compositions and methods for polishing nickel phosphorous surfaces | Dec 03, 13 | Jul 23, 19 | Cabot Microelectronics Corporation |
| 10190024 | Polishing composition | Oct 15, 15 | Jan 29, 19 | Fujimi Incorporated |
| 10039699 | Compositions comprising metathesized unsaturated polyol esters | May 03, 17 | Aug 07, 18 | Elevance Renewable Sciences, Inc. |
| 9982166 | Metal oxide-polymer composite particles for chemical mechanical planarization | Dec 16, 14 | May 29, 18 | Cabot Corporation |
| 9777192 | Chemical mechanical polishing (CMP) composition comprising a protein | Jan 25, 13 | Oct 03, 17 | BASF SE |
| 9771497 | Methods of forming earth-boring tools | Nov 02, 15 | Sep 26, 17 | BAKER HUGHES, A GE COMPANY, LLC, ELEMENT SIX LIMITED, |
Recent Publications
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2025/0033,081 | METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWELRY AND GEM STONES | May 20, 24 | Jan 30, 25 | Not available |
| 2024/0254,366 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE | Jan 24, 24 | Aug 01, 24 | Not available |
| 2024/0240,053 | USE OF SULFONIC ACIDS IN DRY ELECTROLYTES TO POLISH METAL SURFACES THROUGH ION TRANSPORT | Mar 29, 24 | Jul 18, 24 | Not available |
| 2023/0104,949 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING | Jul 08, 22 | Apr 06, 23 | Not available |
| 2022/0290,009 | POLISHING SOLUTION, POLISHING APPARATUS, AND POLISHING METHOD | Sep 10, 21 | Sep 15, 22 | Kioxia Corporation |
| 2020/0362,200 | SEMICONDUCTOR PROCESSING COMPOSITION AND PROCESSING METHOD | May 11, 20 | Nov 19, 20 | JSR Corporation |
| 2019/0359,859 | CHEMICAL MECHANICAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING PROCESS USING THE SAME | May 24, 18 | Nov 28, 19 | Not available |
Top Owners in This Subclass
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Patents Issued To Date - By Filing Year
Average Time to Issuance
- 21 Months (last 2 years Issuances)
- 21 Months (last 5 years Issuances)