C23F

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Description

NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES (working of metal by electro-erosion B23H; desurfacing by applying flames B23K 7/00; working metal by laser beam B23K 26/00; producing decorative effects by removing surface- material, e.g. by engraving, by etching, B44C 1/22; electrolytic etching or polishing C25F); INHIBITING CORROSION OF METALLIC MATERIAL; INHIBITING INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 (inhibition or prevention of corrosion or incrustation during processing of hydrocarbons C10G 7/10, C10G 9/16, C10G 75/00)

Subclasses

SubclassTitle
1/00 Etching metallic material by chemical means
1/02 Etching metallic material by chemical means Local etching
1/04 Etching metallic material by chemical means Local etching Chemical milling
1/06 Etching metallic material by chemical means Sharpening files
1/08 Etching metallic material by chemical means Apparatus, e.g. for photomechanical printing surfaces
1/10 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence)
1/12 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Gaseous compositions
1/14 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions
1/16 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence)
1/18 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching copper or alloys thereof
1/20 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching aluminium or alloys thereof
1/22 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching magnesium or alloys thereof
1/24 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching silicon or germanium
1/26 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching refractory metals
1/28 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching iron group metals
1/30 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Acidic compositions (C23F 1/42 takes precedence) for etching other metallic material
1/32 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Alkaline compositions (C23F 1/42 takes precedence)
1/34 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Alkaline compositions (C23F 1/42 takes precedence) for etching copper or alloys thereof
1/36 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Alkaline compositions (C23F 1/42 takes precedence) for etching aluminium or alloys thereof
1/38 Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Alkaline compositions (C23F 1/42 takes precedence) for etching refractory metals

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