G03F

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Description

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)

Subclasses

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Subclass Title
1/00 Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
1/20 Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
1/22 Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof
1/24 Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof Reflection masks; Preparation thereof
1/26 Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof

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Recent Patents

Not Available

Recent Publications

Not Available
Publication #TitleFiling DatePub DatePatent Owner
2020/0019,064 OPTICAL ASSEMBLY FOR GUIDING AN OUTPUT BEAM OF A FREE ELECTRON LASER Sep 23, 19 Jan 16, 20 , Not available
2020/0019,671 INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME Jul 02, 19 Jan 16, 20 , Not available
2020/0019,055 PHOTOSENSITIVE COMPOSITION, COLOR FILTER AND METHOD FOR FORMING THE COLOR FILTER Jun 05, 19 Jan 16, 20 , eChem Solutions Corp.
2020/0019,052 ADAPTIVE ALGORITHM TO GENERATE OPTICAL PROXIMITY CORRECTION LITHOGRAPHIC RECIPE Aug 30, 19 Jan 16, 20 , Not available
2020/0018,590 LENGTH MEASUREMENT DEVICE Sep 26, 17 Jan 16, 20 , Nidec-Read Corporation
2020/0019,057 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE Sep 24, 19 Jan 16, 20 , FUJIFILM Corporation
2020/0019,062 NOVEL COMPOSITIONS AND PROCESSES FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS Dec 19, 17 Jan 16, 20 , Not available
2020/0018,709 WAFER DISTORTION MEASUREMENT AND OVERLAY CORRECTION Jul 16, 18 Jan 16, 20 , Not available
2020/0019,074 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, MANUFACTURING METHOD OF FLAT PANEL DISPLAY, DEVICE MANUFACTURING METHOD, AND MOVABLE BODY DRIVE METHOD Sep 10, 19 Jan 16, 20 , Nikon Corporation
2020/0019,071 CARRIER DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, MANUFACTURING METHOD OF FLAT-PANEL DISPLAY, DEVICE MANUFACTURING METHOD, AND CARRYING METHOD Sep 29, 17 Jan 16, 20 , Nikon Corporation
2020/0019,670 METHOD FOR GENERATING LAYOUT DIAGRAM INCLUDING PROTRUDING PIN CELL REGIONS AND SEMICONDUCTOR DEVICE BASED ON SAME Jun 19, 19 Jan 16, 20 , Not available
2020/0019,075 PHOTOMASK PURGING SYSTEM AND METHOD Nov 26, 18 Jan 16, 20 , Taiwan Semiconductor Manufacturing Co., Ltd.
2020/0019,060 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, INSULATING FILM, AND ELECTRONIC COMPONENT Mar 12, 18 Jan 16, 20 , TORAY INDUSTRIES, INC.
2020/0016,635 PHOTORESIST REMOVAL METHOD USING RESIDUE GAS ANALYZER Jul 04, 19 Jan 16, 20 , Not available
2020/0017,678 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS Jun 28, 19 Jan 16, 20 , Not available
2020/0019,072 PARTICLE REMOVAL FROM WAFER TABLE AND PHOTOMASK Oct 18, 18 Jan 16, 20 , Taiwan Semiconductor Manufacturing Co., Ltd.
2020/0019,061 CURED FILM-FORMING COMPOSITION Sep 20, 17 Jan 16, 20 , Nissan Chemical Corporation
2020/0018,906 WAFER-LEVEL LENSES FOR FIBER OPTIC CONNECTORS AND METHODS FOR MAKING THE SAME Jul 09, 19 Jan 16, 20 , Not available
2020/0019,054 PHOTOSENSITIVE RESIN COMPOSITION, SOLDER RESIST FILM USING SAID PHOTOSENSITIVE RESIN COMPOSITION, FLEXIBLE PRINTED CIRCUIT AND IMAGE DISPLAY DEVICE Feb 06, 18 Jan 16, 20 , Not available
2020/0016,761 PHOTORESIST BOTTLE REPLACEMENT SYSTEM Jul 13, 18 Jan 16, 20 , Taiwan Semiconductor Manufacturing Co., Ltd.

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Patents Issued To Date - By Filing Year

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