PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 8,444,768 | Compositions and methods for removing organic substances | Mar 27, 09 | May 21, 13 | EASTMAN CHEMICAL COMPANY |
| 8,445,165 | Pellicle for lithography | Nov 11, 10 | May 21, 13 | SHIN-ETSU CHEMICAL CO., LTD. |
| 8,445,166 | Fabrication method of lithography mask and formation method of fine pattern using the same | Dec 12, 08 | May 21, 13 | SAMSUNG ELECTRONICS CO. LTD. |
| 8,445,174 | Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same | Jan 30, 12 | May 21, 13 | NDSU RESEARCH FOUNDATION |
| 8,445,175 | Composition containing hydroxylated condensation resin for forming resist underlayer film | Jun 15, 07 | May 21, 13 | NISSAN CHEMICAL INDUSTRIES, LTD. |
| 8,445,176 | Lithographic printing plate precursor | May 15, 08 | May 21, 13 | AGFA GRAPHICS NV |
| 8,445,177 | Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part | Nov 19, 10 | May 21, 13 | HITACHI CHEMICAL COMPANY, LTD. |
| 8,445,178 | Composition for radical polymerization and method of forming pattern using the composition | Jun 05, 09 | May 21, 13 | SAMSUNG ELECTRONICS CO., LTD. |
| 8,445,179 | Method for treating a lithographic printing plate | Jun 10, 08 | May 21, 13 | AGFA GRAPHICS NV |
| 8,445,180 | Water-developable photopolymer plate for letterpress printing | Dec 21, 04 | May 21, 13 | ASAHI KASEI CHEMICALS CORPORATION |
| 8,445,181 | Antireflective coating composition and process thereof | Jun 03, 10 | May 21, 13 | AZ ELECTRONIC MATERIALS USA CORP. |
| 8,445,182 | Double exposure technology using high etching selectivity | Apr 19, 10 | May 21, 13 | ADVANCED MICRO DEVICES, INC. |
| 8,445,183 | Method of manufacturing semiconductor device and pattern formation method | Jun 29, 10 | May 21, 13 | SONY CORPORATION |
| 8,445,184 | Pattern formation method | Jan 20, 11 | May 21, 13 | PANASONIC CORPORATION |
| 8,445,185 | Method of manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece | Nov 19, 10 | May 21, 13 | SEIKO INSTRUMENTS INC. |
| 8,445,187 | Hardmask composition having antireflective properties and method of patterning material on substrate using the same | Jul 14, 11 | May 21, 13 | CHEIL INDUSTRIES, INC. |
| 8,445,188 | Process for formation of highly uniform arrays of nano-holes and nano-pillars | Sep 14, 09 | May 21, 13 | NATIONAL SCIENCE FOUNDATION |
| 8,446,634 | Color conversion apparatus, and color conversion method and computer program product | Mar 05, 10 | May 21, 13 | RICOH COMPANY, LIMITED |
| 8,446,653 | Image forming apparatus and image forming method which prevent toner from peeling from a secondary color area of a multicolor image while the image is on the photosensitive member of the apparatus | Sep 17, 10 | May 21, 13 | CANON KABUSHIKI KAISHA |
| 8,440,371 | Imaging devices, methods of forming same, and methods of forming semiconductor device structures | Jan 07, 11 | May 14, 13 | MICRON TECHNOLOGY INC. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2013/0126,833 | METHOD OF MANUFACTURING ORGANIC EL APPARATUS | Nov 14, 12 | May 23, 13 | CANON KABUSHIKI KAISHA |
| 2013/0128,244 | Exposure Apparatus and Device Manufacturing Method Having Lower Scanning Speed to Expose Peripheral Shot Area | Dec 13, 12 | May 23, 13 | NIKON CORPORATION |
| 2013/0128,245 | Exposure Apparatus and Device Manufacturing Method | Jan 16, 13 | May 23, 13 | NIKON CORPORATION |
| 2013/0128,246 | Lithography Method and Apparatus | Jul 18, 11 | May 23, 13 | ASML NEITHERLANDS B.V. |
| 2013/0128,248 | LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, ILLUMINATING METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS | Mar 31, 11 | May 23, 13 | Not available |
| 2013/0128,249 | Fiber Delivery for Metrology Systems Used in Lithography Tools | Nov 08, 12 | May 23, 13 | ZYGO CORPORATION |
| 2013/0128,250 | RETICLE ASSEMBLY, A LITHOGRAPHIC APPARATUS, THE USE IN A LITHOGRAPHIC PROCESS, AND A METHOD TO PROJECT TWO OR MORE IMAGE FIELDS IN A SINGLE SCANNING MOVEMENT OF A LITHOGRAPHIC PROCESS | Nov 16, 12 | May 23, 13 | ASML NETHERLANDS B.V. |
| 2013/0128,251 | IMAGING OPTICAL SYSTEM | Jan 18, 13 | May 23, 13 | CARL ZEISS SMT GMBH |
| 2013/0128,252 | MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS | Jan 22, 13 | May 23, 13 | CARL ZEISS SMT GMBH |
| 2013/0128,253 | EXPOSURE APPARATUS USING MICROLENS ARRAY AND OPTICAL MEMBER | Jul 26, 11 | May 23, 13 | V TECHNOLOGY CO., LTD. |
| 2013/0128,254 | Thermally Stable Optical Sensor Mount | Nov 08, 12 | May 23, 13 | ZYGO CORPORATION |
| 2013/0128,256 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD | Dec 03, 12 | May 23, 13 | ASML NETHERLANDS B.V. |
| 2013/0128,712 | REACTANTS FOR OPTICAL DATA STORAGE MEDIA AND METHODS FOR USE | Nov 17, 11 | May 23, 13 | GENERAL ELECTRIC COMPANY |
| 2013/0128,713 | REVERSE SATURABLE ABSORBTION SENSITIZERS FOR OPTICAL DATA STORAGE MEDIA AND METHODS FOR USE | Nov 17, 11 | May 23, 13 | GENERAL ELECTRIC COMPANY |
| 2013/0129,941 | NEGATIVE LIGHT SENSITIVE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE | Aug 01, 12 | May 23, 13 | BOE TECHNOLOGY GROUP CO. LTD. |
| 2013/0129,986 | TECHNIQUES FOR MARKING PRODUCT HOUSINGS | Jan 22, 13 | May 23, 13 | APPLE INC. |
| 2013/0129,988 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Nov 16, 12 | May 23, 13 | SHIN-ETSU CHEMICAL CO. LTD. |
| 2013/0129,991 | MULTIPLE EXPOSURE WITH IMAGE REVERSAL IN A SINGLE PHOTORESIST LAYER | Aug 09, 11 | May 23, 13 | Not available |
| 2013/0129,995 | ASSIST LAYERS FOR EUV LITHOGRAPHY | Nov 20, 12 | May 23, 13 | BREWER SCIENCE INC. |
| 2013/0130,157 | METHOD FOR MANUFACTURING PHOTO MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM | Nov 16, 12 | May 23, 13 | Not available |
