PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
| Subclass | Title |
|---|---|
| 1/00 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof |
| 1/20 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof |
| 1/22 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof |
| 1/24 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof Reflection masks; Preparation thereof |
| 1/26 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof |
| 1/28 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof |
| 1/29 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof Rim PSM or outrigger PSM; Preparation thereof |
| 1/30 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof |
| 1/32 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof |
| 1/34 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof Phase-edge PSM, e.g. chromeless PSM; Preparation thereof |
| 1/36 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes |
| 1/38 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof |
| 1/40 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate |
| 1/42 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Alignment or registration features, e.g. alignment marks on the mask substrates |
| 1/44 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales |
| 1/46 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Antireflective coatings |
| 1/48 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Protective coatings |
| 1/50 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Mask blanks not covered by groups G03F 1/2-G03F 1/26 ; Preparation thereof |
| 1/52 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Reflectors |
| 1/54 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Absorbers, e.g. opaque materials |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2025/0114,980 | IMPRINTING APPARATUS | Nov 30, 24 | Apr 10, 25 | Not available |
| 2025/0116,615 | EUV Microscope | Dec 16, 24 | Apr 10, 25 | Not available |
| 2025/0116,800 | FLEXIBLE MICROPOROUS MULTI-RESONANT PLASMONICS MESHES | Nov 04, 22 | Apr 10, 25 | Not available |
| 2025/0116,920 | ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANK | Dec 16, 24 | Apr 10, 25 | AGC Inc. |
| 2025/0116,921 | ORIGINAL PLATE, RIBLET MOLDING METHOD, RIBLET TRANSFER SHEET AND METHOD FOR MANUFACTURING THE SAME, AND TOOL | Jan 24, 22 | Apr 10, 25 | Nikon Corporation |
| 2025/0116,922 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Dec 18, 24 | Apr 10, 25 | JSR Corporation |
| 2025/0116,923 | RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME | Sep 16, 24 | Apr 10, 25 | Inha University Research and Business Foundation |
| 2025/0116,924 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Oct 01, 24 | Apr 10, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0116,925 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Oct 02, 24 | Apr 10, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0116,926 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Oct 02, 24 | Apr 10, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0116,927 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | Oct 07, 24 | Apr 10, 25 | Not available |
| 2025/0116,928 | SUBSTRATE COATING RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN | Nov 20, 24 | Apr 10, 25 | Not available |
| 2025/0116,929 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Sep 30, 24 | Apr 10, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0116,930 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED CIRCUIT BOARD, AND METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARD | Jan 18, 23 | Apr 10, 25 | Not available |
| 2025/0116,931 | PHOTORESIST COMPOSITION | Oct 10, 23 | Apr 10, 25 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 2025/0116,932 | THIOL-CONTAINING PHOTORESIST COMPOSITIONS FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Mar 11, 24 | Apr 10, 25 | Not available |
| 2025/0116,933 | MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | Oct 04, 23 | Apr 10, 25 | Not available |
| 2025/0116,934 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | Oct 01, 24 | Apr 10, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0116,935 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Oct 04, 24 | Apr 10, 25 | JSR Corporation |
| 2025/0116,936 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | Feb 21, 23 | Apr 10, 25 | Nissan Chemical Corporation |
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