Class G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
Subclass 1/00: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 12216399 | Method of manufacturing semiconductor device | Feb 20, 24 | Feb 04, 25 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12197136 | Method of determining control parameters of a device manufacturing process | Aug 03, 23 | Jan 14, 25 | ASML NETHERLANDS B.V. |
| 12154862 | System and method for aligned stitching | May 02, 23 | Nov 26, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12092953 | Patterning of nanostructures using imprint lithography | Jun 26, 17 | Sep 17, 24 | University of Massachusetts |
| 12060635 | Hard mask, substrate processing method, and substrate processing apparatus | May 22, 20 | Aug 13, 24 | Tokyo Electron Limited |
| 11947261 | Method for making photolithography mask plate | Jan 15, 21 | Apr 02, 24 | Tsinghua University; Hon Hai Precision Industry Co., Ltd; |
| 11940726 | Mask protective module, pellicle having the same, and lithography apparatus having the same | Jun 28, 22 | Mar 26, 24 | Industry-University Cooperation Foundation Hanyang University |
| 11934091 | Photolithography mask and photolithography system comprising said photolithography mask | Mar 31, 22 | Mar 19, 24 | TECHNOLOGIES DIGITHO INC. |
| 11914288 | Photomask having recessed region | Aug 19, 21 | Feb 27, 24 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 11892662 | Diffraction light guide plate and method of manufacturing diffraction light guide plate | Oct 23, 18 | Feb 06, 24 | LG Chem Ltd. |
| 11841615 | Mask and method for manufacturing the same, exposure system, method for manufacturing a display substrate, and display device | May 26, 20 | Dec 12, 23 | CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO.,LTD.; BOE Technology Group Co. Ltd.; |
| 11768442 | Method of determining control parameters of a device manufacturing process | Oct 25, 22 | Sep 26, 23 | ASML NETHERLANDS B.V. |
| 11765943 | Array substrate and manufacturing method therefor, display device, and mask plate | May 08, 20 | Sep 19, 23 | BOE Technology Group Co. Ltd. |
| 11676908 | System and method for aligned stitching | Dec 16, 19 | Jun 13, 23 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 11520231 | Flexible display substrate and method for manufacturing the same | Nov 22, 18 | Dec 06, 22 | WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. |
| 11513442 | Method of determining control parameters of a device manufacturing process | Aug 22, 18 | Nov 29, 22 | ASML Netherlands B.V. |
| 11440850 | Powder for additive modeling, structure, semiconductor production device component, and semiconductor production device | Jul 23, 20 | Sep 13, 22 | CANON KABUSHIKI KAISHA |
| 11401214 | Powder for additive modeling, structure, semiconductor production device component, and semiconductor production device | Jul 23, 20 | Aug 02, 22 | CANON KABUSHIKI KAISHA |
| 11402746 | Mask protective module, pellicle having the same, and lithography apparatus having the same | Mar 11, 19 | Aug 02, 22 | Industry-University Cooperation Foundation Hanyang University |
| 11397840 | Edge placement errors for optical lithography | Mar 14, 19 | Jul 26, 22 | Synopsys, Inc. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2024/0405,030 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, MASK, AND DISPLAY APPARATUS | Sep 27, 22 | Dec 05, 24 | Not available |
| 2024/0067,558 | HOMOGENOUS SILICA-TITANIA GLASS | Aug 21, 23 | Feb 29, 24 | Not available |
| 2024/0012,324 | PHOTOMASK HAVING RECESSED REGION | Sep 22, 23 | Jan 11, 24 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 2021/0132,500 | METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE | Jan 15, 21 | May 06, 21 | Not available |
| 2020/0346,982 | POWDER FOR ADDITIVE MODELING, STRUCTURE, SEMICONDUCTOR PRODUCTION DEVICE COMPONENT, AND SEMICONDUCTOR PRODUCTION DEVICE | Jul 23, 20 | Nov 05, 20 | Not available |
| 2020/0117,104 | MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD UTILIZING SAID CORRECTION SYSTEM | Sep 10, 19 | Apr 16, 20 | TOSHIBA MEMORY CORPORATION |
| 2020/0089,098 | PHOTOMASK AND METHOD FOR FORMING THE SAME | Sep 18, 18 | Mar 19, 20 | Not available |
| 2020/0057,362 | PHOTOMASK LASER ETCH | Jul 12, 19 | Feb 20, 20 | Not available |
| 2019/0259,600 | MECHANISMS FOR FORMING PATTERNS USING MULTIPLE LITHOGRAPHY PROCESSES | Apr 29, 19 | Aug 22, 19 | Not available |
| 2019/0187,552 | OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE OPC METHOD | Jul 05, 18 | Jun 20, 19 | Not available |
| 2019/0011,827 | METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, PATTERN FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, CONTAINER, AND QUALITY INSPECTION METHOD | Sep 13, 18 | Jan 10, 19 | FUJIFILM Corporation |
| 2018/0335,692 | PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK | May 09, 18 | Nov 22, 18 | S&S TECH CO., LTD. |
| 2018/0322,224 | METHODS AND SYSTEMS FOR PARAMETER-SENSITIVE AND ORTHOGONAL GAUGE DESIGN FOR LITHOGRAPHY CALIBRATION | Jul 16, 18 | Nov 08, 18 | ASML NETHERLANDS B.V. |
| 2018/0203,345 | METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY | Jul 04, 16 | Jul 19, 18 | ASML NETHERLANDS B.V. |
| 2018/0180,985 | PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF | Dec 20, 17 | Jun 28, 18 | Shin-Etsu Chemical Co., Ltd. |
| 2015/0049,318 | OPTICAL ELEMENT, OPTICAL SYSTEM, CAPTURING APPARATUS, OPTICAL EQUIPMENT, AND ORIGINAL RECORDING AND MANUFACTURING METHOD THEREFOR | Aug 11, 14 | Feb 19, 15 | SONY CORPORATION |
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