H01J

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Description

ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; arc lamps with consumable electrodes H05B; particle accelerators H05H)

Subclasses

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Subclass Title
1/00 Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps (details of electron-optical arrangements or of ion traps H01J 3/00)
1/02 Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps (details of electron-optical arrangements or of ion traps H01J 3/00) Main electrodes
1/04 Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps (details of electron-optical arrangements or of ion traps H01J 3/00) Main electrodes Liquid electrodes, e.g. liquid cathode
1/05 Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps (details of electron-optical arrangements or of ion traps H01J 3/00) Main electrodes Liquid electrodes, e.g. liquid cathode characterised by material
1/06 Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps (details of electron-optical arrangements or of ion traps H01J 3/00) Main electrodes Liquid electrodes, e.g. liquid cathode Containers for liquid-pool electrodes; Arrangement or mounting thereof

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Recent Patents

Not Available
Patent #TitleFiling DateIssue DatePatent Owner
9,452,410 Fullerene arc source and fullerene production apparatus comprising the same Jul 30, 14 Sep 27, 16 , XIAMEN FUNANO NEW MATERIAL TECHNOLOGY COMPANY.LTD
9,453,280 Film deposition apparatus, film deposition method and storage medium Sep 04, 12 Sep 27, 16 , TOKYO ELECTRON LIMITED
9,453,281 Precision deposition using miniature-column charged particle beam arrays Jun 21, 15 Sep 27, 16 , MULTIBEAM CORPORATION
9,453,681 Melting furnace including wire-discharge ion plasma electron emitter Jun 17, 13 Sep 27, 16 , ATI PROPERTIES LLC
9,453,803 X-ray radiography system for differential phase contrast imaging of an object under investigation using phase-stepping Aug 22, 13 Sep 27, 16 , SIEMENS AKTIENGESELLSCHAFT
9,453,845 Mass spectroscopy analysis of mutant polypeptides in biological samples Feb 01, 11 Sep 27, 16 , CELL SIGNALING TECHNOLOGY INC.
9,453,846 Mass spectrometry method using matrix Mar 04, 14 Sep 27, 16 , SHIMADZU CORPORATION; NATIONAL UNIVERSITY OF CORPORATION HIROSHIMA UNIVERSITY;
9,453,968 Optical touch sensing apparatus and method using distributed band pass filter Aug 01, 13 Sep 27, 16 , Not available
9,455,057 Method and apparatus for sputtering with a plasma lens Oct 05, 12 Sep 27, 16 , THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
9,455,112 Cathode arrangement, electron gun, and lithography system comprising such electron gun Dec 22, 14 Sep 27, 16 , MAPPER LITHOGRAPHY IP B.V.
9,455,113 System for fast ions generation and a method thereof Dec 09, 15 Sep 27, 16 , HIL APPLIED MEDICAL LTD.; YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM, LTD.;
9,455,114 Systems and methods for particle pulse modulation Aug 21, 15 Sep 27, 16 , MASSACHUSETTS INSTITUTE OF TECHNOLOGY
9,455,115 Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system Dec 17, 14 Sep 27, 16 , CARL ZEISS MICROSCOPY GMBH
9,455,116 Angular scanning using angular energy filter Apr 21, 15 Sep 27, 16 , AXCELLS TECHNOLOGIES, INC.
9,455,117 Analytical cell Aug 18, 15 Sep 27, 16 , HONDA MOTOR CO., LTD.
9,455,119 Charged particle beam apparatus Mar 23, 15 Sep 27, 16 , HITACHI HIGH-TECH SCIENCE CORPORATION
9,455,120 Particle beam device and method for processing and/or analyzing a sample Jan 06, 12 Sep 27, 16 , CARL ZEISS MICROSCOPY GMBH
9,455,121 Semiconductor inspection system and methods of inspecting a semiconductor device using the same Aug 17, 15 Sep 27, 16 , SAMSUNG ELECTRONICS CO., LTD.
9,455,122 Modulation device and power supply arrangement May 08, 13 Sep 27, 16 , MAPPER LITHOGRAPHY IP B.V.
9,455,123 Current regulation method of multiple beams Mar 06, 14 Sep 27, 16 , NUFLARE TECHNOLOGY, INC.

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Recent Publications

Not Available
Publication #TitleFiling DatePub DatePatent Owner
2016/0273,094 Magnetic Configuration for a Magnetron Sputter Deposition System Jun 09, 14 Sep 22, 16 SOLERAS ADVANCED COATINGS BVBA,
2016/0274,058 Method of Associating Precursor and Product Ions Nov 11, 14 Sep 22, 16 MICROMASS UK LIMITED,
2016/0274,059 Method of Isolating Ions Nov 11, 14 Sep 22, 16 ,
2016/0274,145 Reconstruction Of Scanning Probe Microscopy Cantilever Tip Mar 18, 15 Sep 22, 16 HGST NETHERLANDS B.V.,
2016/0275,237 AMINO ACID SEQUENCE ANALYZING METHOD AND SYSTEM Mar 18, 15 Sep 22, 16 SHIMADZU CORPORATION,
2016/0276,124 X-RAY TUBE Mar 14, 16 Sep 22, 16 TOSHIBA ELECTRON TUBES & DEVICES CO., LTD.,
2016/0276,125 Phase Plate, Method of Fabricating Same, and Electron Microscope Mar 11, 16 Sep 22, 16 JEOL LTD.,
2016/0276,126 LOW SPECIMEN DRIFT TEM HOLDER AND COOLER FOR USE IN MICROSCOPY Jun 02, 16 Sep 22, 16 ,
2016/0276,127 SYSTEM AND METHOD FOR SCANNING AN OBJECT Mar 16, 15 Sep 22, 16 APPLIED MATERIALS ISRAEL, LTD.,
2016/0276,128 Charged Particle Beam Apparatus, Image Forming Method Using a Charged Particle Beam Apparatus, and Image Processing Apparatus Feb 11, 16 Sep 22, 16 HITACHI HIGH-TECHNOLOGIES CORPORATION,
2016/0276,129 COMPRESSIVE TRANSMISSION MICROSCOPY Mar 18, 16 Sep 22, 16 BATTELLE MEMORIAL INSTITUTE,
2016/0276,130 METHOD OF PERFORMING SPECTROSCOPY IN A TRANSMISSION CHARGED-PARTICLE MICROSCOPE Mar 17, 16 Sep 22, 16 FEI COMPANY,
2016/0276,131 Bi-Directional Double-Pass Multi-Beam Writing Mar 18, 16 Sep 22, 16 IMS NANOFABRICATION AG,
2016/0276,132 Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension Mar 17, 16 Sep 22, 16 IMS NANOFABRICATION AG,
2016/0276,133 PLASMA ETCHING OF POROUS SUBSTRATES Mar 16, 16 Sep 22, 16 KATHOLIEKE UNIVERSITEIT LEUVEN,
2016/0276,134 ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR Mar 17, 15 Sep 22, 16 APPLIED MATERIALS, INC.,
2016/0276,135 SUBSTRATE PROCESSING APPARATUS Jan 26, 16 Sep 22, 16 HITACHI KOKUSAI ELECTRIC INC.,
2016/0276,136 Elongated Capacitively Coupled Plasma Source For High Temperature Low Pressure Environments May 31, 16 Sep 22, 16 ,
2016/0276,137 SUB-PULSING DURING A STATE Jun 02, 16 Sep 22, 16 ,
2016/0276,138 POWER GENERATOR WITH FREQUENCY TUNING FOR USE WITH PLASMA LOADS Mar 21, 16 Sep 22, 16 ADVANCED ENERGY INDUSTRIES, INC.,

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Patents Issued To Date - By Filing Year

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