Class G09G : ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
Subclass 1/02: Control arrangements or circuits, of interest only in connection with cathode-ray tube indicators (cathode-ray oscilloscopes G01R 13/2; television H04N) Storage circuits (G09G 1/06-G09G 1/28 take precedence)
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 11104825 | Metal compound chemically anchored colloidal particles and methods of production and use thereof | Nov 13, 18 | Aug 31, 21 | VERSUM MATERIALS US, LLC |
| 11043151 | Surface treated abrasive particles for tungsten buff applications | Oct 03, 17 | Jun 22, 21 | CMC Materials, Inc. |
| 10954411 | Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide | May 16, 19 | Mar 23, 21 | Rohm and Haas Electronic Materials CMP Holdings Inc. |
| 10727076 | Slurry and manufacturing semiconductor using the slurry | Oct 25, 18 | Jul 28, 20 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 10676647 | Composition for tungsten CMP | Dec 31, 18 | Jun 09, 20 | Cabot Microelectronics Corporation |
| 10453546 | Shift register, gate driving circuit containing the same, and method for driving the same | Oct 25, 16 | Oct 22, 19 | BOE Technology Group Co. Ltd. |
| 10233358 | Polishing composition for magnetic disc substrate | Aug 23, 17 | Mar 19, 19 | YAMAGUCHI SEIKEN KOGYO CO., LTD. |
| 10128146 | Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures | Jul 28, 16 | Nov 13, 18 | GlobalWafers Co., Ltd. |
| 10011741 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Mar 02, 16 | Jul 03, 18 | VERSUM MATERIALS US, LLC |
| 9783702 | Aqueous compositions of low abrasive silica particles | Oct 19, 16 | Oct 10, 17 | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
| 9679530 | Compressing graphics data rendered on a primary computer for transmission to a remote computer | Apr 30, 12 | Jun 13, 17 | NVIDIA CORPORATION |
| 9401104 | Polishing composition for edge roll-off improvement | May 05, 14 | Jul 26, 16 | CABOT MICROELECTRONICS CORPORATION |
| 9305476 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | May 12, 15 | Apr 05, 16 | VERSUM MATERIALS US, LLC |
| 9165489 | CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity | May 29, 14 | Oct 20, 15 | CABOT MICROELECTRONICS CORPORATION |
| 9070632 | Aqueous polishing composition and process for chemically mechanically polishing substrates having patterned or unpatterned low-k dielectric layers | Oct 04, 11 | Jun 30, 15 | BASF SE |
| 8275031 | System and method for analyzing multiple display data rates in a video system | Dec 15, 05 | Sep 25, 12 | AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. |
| 7825931 | Data display system, data relay device, data relay method, data system, sink device, and data read method | Apr 30, 09 | Nov 02, 10 | KABUSHIKI KAISHA TOSHIBA |
| 7825932 | Data display system, data relay device, data relay method, data system, sink device, and data read method | Apr 30, 09 | Nov 02, 10 | KABUSHIKI KAISHA TOSHIBA |
| 7667706 | Data display system, data relay device, data relay method, data system, sink device, and data read method | Jan 17, 06 | Feb 23, 10 | KABUSHIKI KAISHA TOSHIBA |
| 7589734 | Data display system, data relay device, data relay method, data system, sink device, and data read method | Jun 13, 05 | Sep 15, 09 | KABUSHIKI KAISHA TOSHIBA |
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