C09G 1/00

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Class  C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES


Subclass 1/00: Polishing compositions (French polish C09F 11/00; detergents C11D)

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
10597558 Chemical mechanical polishing composition and method for tungstenOct 20, 18Mar 24, 20Rohm and Haas Electronic Materials CMP Holdings, Inc.
10577445 Polishing composition for magnetic disk substrateOct 24, 18Mar 03, 20YAMAGUCHI SEIKEN KOGYO CO., LTD.
10570315 Buffered slurry formulation for cobalt CMPOct 30, 17Feb 25, 20Fujimi Incorporated
10562783 Processing of aluminaOct 20, 15Feb 18, 20Fujimi Incorporated
10421890 Composite particles, method of refining and use thereofMar 17, 17Sep 24, 19VERSUM MATERIALS US, LLC
10377921 Chemical mechanical polishing method for cobaltSep 21, 17Aug 13, 19Rohm and Haas Electronics Materials CMP Holdings Inc.
10335924 Method and blasting means for producing a satinized finish on an aluminium substrateAug 09, 16Jul 02, 19VULKAN INOX GMBH
10319601 Slurry for polishing of integrated circuit packagingMar 23, 17Jun 11, 19Applied Materials Inc.
10319605 Semiconductor treatment composition and treatment methodMay 02, 17Jun 11, 19JSR Corporation
10297461 CMP polishing agent, manufacturing method thereof, and method for polishing substrateAug 28, 15May 21, 19Shin-Etsu Chemical Co. Ltd.
10253216 Additives for barrier chemical mechanical planarizationJun 22, 17Apr 09, 19VERSUM MATERIALS US, LLC
10233356 Polishing slurry for cobalt-containing substrateMar 06, 17Mar 19, 19Rohm and Haas Electronic Materials CMP Holdings, Inc.
10221336 Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themAug 18, 17Mar 05, 19rohm and Hass Electronic Materials CMP Holdings, Inc.
10213900 Abrasive materialFeb 24, 17Feb 26, 19KAMEI TEKKOUSHO LTD.
10106705 Polishing compositions and methods of use thereofMar 29, 17Oct 23, 18Fujifilm Planar Solutions, LLC
10077382 Method for polishing cobalt-containing substrateMar 06, 17Sep 18, 18Rohm and Haas Electronic Materials CMP Holdings, Inc.
10066127 Composition for chemical mechanical polishing and method for reducing chemical mechanical polishing surface defectsJul 14, 16Sep 04, 18Taiwan Semiconductor Manufacturing Company Ltd.
10037894 Polishing liquid for metal and polishing methodJan 29, 13Jul 31, 18Hitachi Chemical Company, Ltd.
9962811 Method and blasting means for producing a sanitized finish on an aluminum substrateSep 10, 12May 08, 18VULKAN INOX GMBH
9944829 Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC waferOct 24, 16Apr 17, 18Not available

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2016/0108,284 POLISHING COMPOSITIONMay 01, 14Apr 21, 16FUJIMI INCORPORATED

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Patents Issued To Date - By Filing Year

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