C09G 1/02

Sub-Class

Watch 9Status Updates

Stats

Description

Class  C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES


Subclass 1/02: Polishing compositions (French polish C09F 11/00; detergents C11D) containing abrasives or grinding agents

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12264265 Concentrated liquid of polishing composition and polishing method using sameJun 10, 21Apr 01, 25Fujimi Incorporated
12264266 Chemical mechanical polishing liquidDec 03, 20Apr 01, 25ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD.
12261055 Slurry compositions for chemical mechanical planarizationNov 07, 22Mar 25, 25TAIWAN SSEMICONDUCTOR MANUFACTURING CO., LTD.
12258492 Polishing composition, polishing method, and method for manufacturing substrateOct 06, 23Mar 25, 25Fujimi Incorporated
12258491 Polishing liquid, polishing liquid set, and polishing methodJan 06, 21Mar 25, 25Resonac Corporation
12252633 Polishing liquid and method for manufacturing glass substrateMay 22, 23Mar 18, 25501 Hoya Corporation
12252632 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing methodJun 11, 20Mar 18, 25Entegris Inc.
12247140 Slurry and polishing methodSep 25, 18Mar 11, 25Resonac Corporation
12247141 Polishing slurry compositionNov 04, 19Mar 11, 25KCTECH CO., LTD.
12234382 CMP composition including anionic and cationic inhibitorsJul 26, 21Feb 25, 25CMC MATERIALS LLC
12234383 Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereofMay 25, 21Feb 25, 25VERSUM MATERIALS US, LLC
12227673 Composition and method for silicon nitride CMPDec 04, 18Feb 18, 25CMC MATERIALS LLC
12227674 Polishing composition comprising polishing particles having high water affinityJul 20, 22Feb 18, 25Nissan Chemical Corporation
12221557 Polishing composition and polishing methodFeb 24, 22Feb 11, 25FUJIMI INCORPORATED
12224179 Metal heterojunction structure with capping metal layerMar 15, 23Feb 11, 25Taiwan Semiconductor Manufacturing Co., Ltd.
12203007 Polishing liquidJul 23, 21Jan 21, 25501 Hoya Corporation
12203008 Polishing slurryDec 26, 19Jan 21, 25NITTA DUPONT INCORPORATED
12195386 Chemically strengthened glass and manufacturing method of chemically strengthened glassMar 25, 22Jan 14, 25AGC INC.
12187618 Silica particle dispersion liquid and production method thereofSep 23, 20Jan 07, 25JGC Catalysts and Chemicals Ltd
12187918 Method of manufacturing gallium oxide substrate and polishing slurry for gallium oxide substrateSep 21, 21Jan 07, 25AGC INC.

more results

Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0115,785 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAMEJul 12, 24Apr 10, 25Samsung Electronics Co. Ltd.; SOULBRAIN CO., LTD;
2025/0115,786 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAMESep 30, 24Apr 10, 25SK enpulse Co., Ltd.
2025/0115,787 POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAMESep 30, 24Apr 10, 25SK enpulse Co., Ltd.
2025/0112,050 POLISHING APPARATUS HAVING BEAM FOR SURFACE TREATMENT AND POLISHING METHOD USING THE SAMESep 28, 23Apr 03, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
2025/0109,317 POLISHING COMPOSITIONJul 25, 24Apr 03, 25Fujimi Incorporated
2025/0109,319 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATESep 20, 24Apr 03, 25Fujimi Incorporated
2025/0109,318 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATEAug 29, 24Apr 03, 25Fujimi Incorporated
2025/0101,260 CMP POLISHING SOLUTION, STORAGE SOLUTION, AND POLISHING METHODJan 12, 22Mar 27, 25Not available
2025/0101,261 CHEMICAL MECHANICAL PLANARIZATION SLURRY PROCESSING TECHNIQUES AND SYSTEMS AND METHODS FOR POLISHING SUBSTRATE USING THE SAMEAug 12, 22Mar 27, 25Not available
2025/0101,262 POLISHING COMPOSITIONSep 17, 24Mar 27, 25Fujimi Incorporated
2025/0101,263 POLISHING COMPOSITIONS AND METHODS OF USE THEREOFSep 19, 24Mar 27, 25Not available
2025/0092,284 POLISHING COMPOSITION AND SURFACE TREATMENT METHODAug 19, 24Mar 20, 25Fujimi Incorporated
2025/0084,280 MOLYBDENUM CHEMICAL MECHANICAL POLISHING COMPOUNDS AND METHODS OF USE THEREOFAug 29, 24Mar 13, 25Not available
2025/0084,294 SLURRY AND POLISHING METHODNov 26, 24Mar 13, 25Not available
2025/0084,281 POLISHING COMPOSITION AND METHOD FOR POLISHING SUBSTRATE USING THE COMPOSITIONSep 05, 24Mar 13, 25Not available
2025/0075,103 SLURRY SOLUTION, METHOD FOR FABRICATING THE SLURRY SOLUTION, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SLURRY SOLUTIONApr 19, 24Mar 06, 25Samsung Electronics Co. Ltd.
2025/0075,104 TITANIUM OXIDE-BASED CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON SILICON FILMSAug 30, 24Mar 06, 25Not available
2025/0059,400 INSULATING FILM POLISHING SOLUTION AND USAGE METHOD THEREOFDec 23, 22Feb 20, 25Not available
2025/0059,401 CHEMICAL MECHANICAL POLISHING SOLUTION AND USAGE METHOD THEREOFDec 23, 22Feb 20, 25Not available
2025/0043,149 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING APPARATUSFeb 02, 24Feb 06, 25Not available

more results

Top Owners in This Subclass

Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More

Patents Issued To Date - By Filing Year

Average Time to Issuance