C09G 1/04

Sub-Class

Watch

Stats

Description

Class  C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES


Subclass 1/04: Polishing compositions (French polish C09F 11/00; detergents C11D) Aqueous dispersions (C09G 1/02 takes precedence)

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
10607853 CMP slurry composition for polishing copper line and polishing method using sameOct 12, 15Mar 31, 20Samsung SDI Co., Ltd.
10597558 Chemical mechanical polishing composition and method for tungstenOct 20, 18Mar 24, 20Rohm and Haas Electronic Materials CMP Holdings, Inc.
10584265 Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using themSep 28, 17Mar 10, 20Rohm and Haas Electronic Materials CMP Holdings, Inc.
10577445 Polishing composition for magnetic disk substrateOct 24, 18Mar 03, 20YAMAGUCHI SEIKEN KOGYO CO., LTD.
10570316 Chemical mechanical polishing (CMP) compositionJul 14, 15Feb 25, 20BASF SE
10570313 Dishing reducing in tungsten chemical mechanical polishingFeb 03, 16Feb 25, 20VERSUM MATERIALS US, LLC
10513633 Floor coating compositions and related methodsJun 10, 16Dec 24, 19RED ALERT WAX, LLC
10507563 Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning methodMar 30, 16Dec 17, 19JSR Corporation
10479911 Composition and method for polishing memory hard disks exhibiting reduced edge roll offJun 05, 18Nov 19, 19Cabot Microelectronics Corporation
10421883 Abrasive particle-dispersion layer composite and polishing slurry composition including the sameDec 21, 16Sep 24, 19KCTECH CO., LTD.
10421868 Water-based coating compositions that resist dirt pickupMar 09, 17Sep 24, 19The Sherwin Williams Company
10392710 Brightening and passivation of stainless steel surfacesJun 03, 15Aug 27, 19Henkel AG & Co. KGaA
10344187 Polishing composition and polishing method using the sameDec 04, 14Jul 09, 19Nitta Haas Incorporated; Sumco Corporation;
10340150 Ni:NiGe:Ge selective etch formulations and method of using sameDec 16, 14Jul 02, 19Entegris, Inc.
10329455 Chemical mechanical planarization slurry and method for forming sameSep 21, 17Jun 25, 19Saint-Gobain Ceramics & Plastics, Inc.
10319601 Slurry for polishing of integrated circuit packagingMar 23, 17Jun 11, 19Applied Materials Inc.
10319605 Semiconductor treatment composition and treatment methodMay 02, 17Jun 11, 19JSR Corporation
10315285 CMP composition and method for polishing rigid disksApr 05, 16Jun 11, 19Cabot Microelectronics Corporation
10297461 CMP polishing agent, manufacturing method thereof, and method for polishing substrateAug 28, 15May 21, 19Shin-Etsu Chemical Co. Ltd.
10287457 Polishing slurry preventing agglomeration of charged colloids without loss of surface activityOct 16, 13May 14, 19Lawrence Livermore National Security, LLC

more results

Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2020/0102,479 HARD ABRASIVE PARTICLE-FREE POLISHING OF HARD MATERIALS METHODDec 04, 19Apr 02, 20Not available
2019/0194,493 COMPOSITION FOR SEMICONDUCTOR TREATMENT AND TREATMENT METHODJun 27, 18Jun 27, 19JSR Corporation
2019/0136,090 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAMEDec 21, 18May 09, 19Not available
2019/0119,526 POLISHING LIQUID FOR GLASS, AND POLISHING METHODSep 22, 17Apr 25, 19Panasonic Intellectual Property Management Co., Ltd.
2019/0062,598 Stop-On Silicon Containing Layer AdditiveOct 30, 18Feb 28, 19VERSUM MATERIALS US, LLC
2018/0340,095 OXIDIZING FLUID FOR THE CHEMICAL-MECHANICAL POLISHING OF CERAMIC MATERIALSMay 24, 18Nov 29, 18Saint-Gobain Ceramics & Plastics, Inc.
2018/0194,968 Method for producing zeta negative nanodiamond dispersion and zeta negative nanodiamond dispersionMar 09, 18Jul 12, 18CARBODEON LTD OY
2018/0148,607 POLISHING COMPOSITIONS WITH IMPROVED LOW TEMPERATURE PROPERTIESMay 20, 16May 31, 18Not available
2018/0086,943 TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND CLEANING METHODMar 24, 16Mar 29, 18JSR Corporation
2018/0086,944 CHEMICAL MECHANICAL PLANARIZATION SLURRY AND METHOD FOR FORMING SAMESep 21, 17Mar 29, 18Not available
2014/0030,897 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAMEFeb 02, 12Jan 30, 14NITTA HAAS INCORPORATED, SUMCO CORPORATION,

more results

Top Owners in This Subclass

Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More

Patents Issued To Date - By Filing Year

Average Time to Issuance