Description
Class C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES
Subclass 1/06: Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions
C09G 1/06
Sub-Class
Stats
- 60 US PATENTS IN FORCE
- 1 US APPLICATIONS PENDING
- 11 Total Patent Owners
- 197 TOTAL INVENTORS
Recent Patents
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 11862472 | Methods for polishing dielectric layer in forming semiconductor device | Aug 23, 22 | Jan 02, 24 | Yangtze Memory Technologies Co., Ltd. |
| 11820919 | Ruthenium CMP chemistry based on halogenation | Feb 17, 22 | Nov 21, 23 | Tokyo Electron Limited |
| 11806836 | Calcium carbonate slurry | Dec 06, 21 | Nov 07, 23 | Illumina Inc. |
| 11767448 | Polishing liquid, polishing liquid set, and polishing method | Mar 20, 19 | Sep 26, 23 | Resonac Corporation |
| 11732157 | Polishing compositions and methods of use thereof | Oct 06, 20 | Aug 22, 23 | Fujifilm Electronic Materials U.S.A., Inc. |
| 11718767 | Chemical mechanical planarization composition for polishing oxide materials and method of use thereof | Aug 06, 19 | Aug 08, 23 | VERSUM MATERIALS US, LLC |
| 11713404 | Polishing agent, polishing method, and liquid additive for polishing | May 12, 21 | Aug 01, 23 | AGC INC. |
| 11680186 | Polishing compositions and methods of using same | Nov 06, 20 | Jun 20, 23 | Fujifilm Electronic Materials U.S.A., Inc. |
| 11518912 | Polishing slurry, method for polishing glass, and method for manufacturing glass | May 19, 21 | Dec 06, 22 | AGC INC. |
| 11505718 | Barrier ruthenium chemical mechanical polishing slurry | May 12, 21 | Nov 22, 22 | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. |
| 11492514 | Derivatized polyamino acids | Dec 16, 20 | Nov 08, 22 | CMC Materials, Inc. |
| 11462415 | Methods for polishing dielectric layer in forming semiconductor device | Jan 29, 21 | Oct 04, 22 | Yangtze Memory Technologies Co., Ltd. |
| 11370939 | Polishing slurry, method for polishing glass, and method for manufacturing glass | Aug 28, 20 | Jun 28, 22 | AGC INC. |
| 11352523 | Polishing liquid, polishing liquid set and polishing method | Mar 20, 19 | Jun 07, 22 | Showa Denko Materials Co., Ltd. |
| 11292939 | Polishing liquid, polishing liquid set and polishing method | Mar 20, 19 | Apr 05, 22 | Showa Denko Materials Co., Ltd. |
| 11292938 | Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films | Sep 11, 19 | Apr 05, 22 | Rohm and Haas Electronic Materials CMP Holdings, Inc. |
| 11286403 | Chemical mechanical polishing composition, chemical mechanical polishing slurry and method for polishing substrate | Jul 17, 19 | Mar 29, 22 | DongJin Semichem Co. Ltd. |
| 11267987 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Mar 02, 20 | Mar 08, 22 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 11254839 | Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing | Dec 12, 19 | Feb 22, 22 | VERSUM MATERIALS US, LLC |
| 11254871 | Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same | Oct 15, 20 | Feb 22, 22 | Samsung SDI Co., Ltd. |
Recent Publications
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2024/0043,721 | Ruthenium CMP Chemistry Based On Halogenation | Oct 18, 23 | Feb 08, 24 | Not available |
Top Owners in This Subclass
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Patents Issued To Date - By Filing Year
Average Time to Issuance
- 26 Months (last 2 years Issuances)
- 26 Months (last 5 years Issuances)