C09G 1/06

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Class  C09G : POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES


Subclass 1/06: Polishing compositions (French polish C09F 11/00; detergents C11D) Other polishing compositions

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
10596536 Composition comprising HF and 3,3,3-trifluoro-2-chloropropeneDec 29, 17Mar 24, 20Arkema France
10597558 Chemical mechanical polishing composition and method for tungstenOct 20, 18Mar 24, 20Rohm and Haas Electronic Materials CMP Holdings, Inc.
10522341 Composition and method for removing residue from chemical-mechanical planarization substrateNov 29, 17Dec 31, 19Cabot Microelectronics Corporation
10319601 Slurry for polishing of integrated circuit packagingMar 23, 17Jun 11, 19Applied Materials Inc.
10319605 Semiconductor treatment composition and treatment methodMay 02, 17Jun 11, 19JSR Corporation
10233357 Polishing composition for magnetic disc substrateMay 09, 17Mar 19, 19YAMAGUCHI SEIKEN KOGYO CO., LTD.
10233356 Polishing slurry for cobalt-containing substrateMar 06, 17Mar 19, 19Rohm and Haas Electronic Materials CMP Holdings, Inc.
10221336 Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themAug 18, 17Mar 05, 19rohm and Hass Electronic Materials CMP Holdings, Inc.
9889416 Composition comprising HF, 3,3,3-trifluoro-2-chloropropene, and E-3,3,3-trifluoro-1-chloropropeneFeb 24, 14Feb 13, 18ARKEMA FRANCE
9828528 Polishing composition containing ceria abrasiveOct 31, 16Nov 28, 17CABOT MICROELECTRONICS CORPORATION
9803106 Methods for fabricating a chemical-mechanical polishing compositionJun 25, 15Oct 31, 17CABOT MICROELECTRONICS CORPORATION
9803108 Aqueous compositions of stabilized aminosilane group containing silica particlesOct 19, 16Oct 31, 17ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
9783702 Aqueous compositions of low abrasive silica particlesOct 19, 16Oct 10, 17ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
9685341 Abrasive composition and method for producing semiconductor substrateMar 12, 13Jun 20, 17FUJIMI INCORPORATED
9505952 Polishing composition containing ceria abrasiveMar 05, 15Nov 29, 16CABOT MICROELECTRONICS CORPORATION
9481811 Composition and method for polishing memory hard disks exhibiting reduced edge roll-offFeb 20, 15Nov 01, 16CABOT MICROELECTRONICS CORPORATION
9305806 Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applicationsJan 16, 15Apr 05, 16VERSUM MATERIALS US, LLC
9299573 Polishing methodMar 12, 13Mar 29, 16HITACHI CHEMICAL COMPANY, LTD.
9249339 Auto reconditioning solutionDec 30, 14Feb 02, 16Not available
6822030 Polymer surface coating made by coalescing a polymer particulate with a coalescing agentMay 13, 03Nov 23, 04ECOLAB INC.

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