C09K 3/14

Sub-Class

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Class  C09K : MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR


Subclass 3/14: Materials not provided for elsewhere Anti-slip materials; Abrasives

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12264256 Slip-resistant coating, method of coating a substrate and a coated substrateSep 27, 19Apr 01, 25Sika Technology AG
12264277 Fixed abrasive articles and methods of forming sameAug 25, 22Apr 01, 25Saint-Gobain Abrasives Inc.; SAINT-GOBAIN ABRASIFS;
12258460 Polishing pad and method of fabricating semiconductor device using the sameSep 07, 21Mar 25, 25SK ENPULSE CO., LTD.
12251590 Azeotropic or azeotropic-like composition comprising hydrogen fluoride and 1,1,2-trifluoroethane, 1-chloro-2,2-difluoroethane, or 1,2-dichloro-1-fluoroethaneOct 24, 23Mar 18, 25DAIKIN INDUSTRIES, LTD.
12252633 Polishing liquid and method for manufacturing glass substrateMay 22, 23Mar 18, 25501 Hoya Corporation
12247140 Slurry and polishing methodSep 25, 18Mar 11, 25Resonac Corporation
12234382 CMP composition including anionic and cationic inhibitorsJul 26, 21Feb 25, 25CMC MATERIALS LLC
12227673 Composition and method for silicon nitride CMPDec 04, 18Feb 18, 25CMC MATERIALS LLC
12226877 Abrasive articleFeb 07, 20Feb 18, 253M Innovative Properties Company
12208491 Use of magnetics with magnetizable abrasive particles, methods, apparatuses and systems using magnetics to make abrasive articlesJan 10, 18Jan 28, 253M Innovative Properties Company
12202099 Coated abrasive article having rotationally aligned formed ceramic abrasive particles and method of makingSep 11, 17Jan 21, 253M Innovative Properties Company
12203007 Polishing liquidJul 23, 21Jan 21, 25501 Hoya Corporation
12187618 Silica particle dispersion liquid and production method thereofSep 23, 20Jan 07, 25JGC Catalysts and Chemicals Ltd
12187918 Method of manufacturing gallium oxide substrate and polishing slurry for gallium oxide substrateSep 21, 21Jan 07, 25AGC INC.
12173193 Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrateOct 18, 18Dec 24, 24Shin-Etsu Chemical Co. Ltd.
12173215 MXene with excellent mechanical strength and fast and high-yield anhydrous synthesis method thereofJan 07, 22Dec 24, 24Korea Institute of Science and Technology
12173219 Slurry and polishing methodSep 25, 18Dec 24, 24Resonac Corporation
12176217 Method for manufacturing a semiconductor using slurryMay 17, 23Dec 24, 24Taiwan Semiconductor Manufacturing Company Ltd.
12157834 Composition and method for polysilicon CMPSep 02, 20Dec 03, 24CMC MATERIALS LLC
12145015 Compositions comprising 2,3,3,3-tetrafluoropropene, 1,1,2,3-tetra-chloropropene, 2-chloro-3,3,3-trifluoropropene, or 2-chloro-1,1,1,2-tetrafluoropropaneMay 22, 24Nov 19, 24THE CHEMOURS COMPANY FC, LLC

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0114,912 COATED ABRASIVE ARTICLE HAVING SPACER PARTICLES, MAKING METHOD AND APPARATUS THEREFORDec 17, 24Apr 10, 25Not available
2025/0115,785 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAMEJul 12, 24Apr 10, 25Samsung Electronics Co. Ltd.; SOULBRAIN CO., LTD;
2025/0115,795 POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHING METHODAug 03, 22Apr 10, 25Not available
2025/0108,483 COATED ABRASIVE ARTICLE HAVING ROTATIONALLY ALIGNED FORMED CERAMIC ABRASIVE PARTICLES AND METHOD OF MAKINGDec 12, 24Apr 03, 25Not available
2025/0109,319 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATESep 20, 24Apr 03, 25Fujimi Incorporated
2025/0109,318 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATEAug 29, 24Apr 03, 25Fujimi Incorporated
2025/0101,283 POLYCRYSTALLINE DIAMOND COMPACT AND PREPARATION METHOD THEREFOR, AND CEMENTED CARBIDE SUBSTRATESep 18, 23Mar 27, 25HAIMINGRUN CO., LTD.
2025/0084,292 SINTERED METAL FRICTION MATERIAL AND PRODUCTION METHOD FOR SAMEFeb 01, 23Mar 13, 25Not available
2025/0084,294 SLURRY AND POLISHING METHODNov 26, 24Mar 13, 25Not available
2025/0084,293 COMPOSITIONS AND METHODS FOR APPLYING ABRASIVE HARDFACING MATERIALSSep 11, 24Mar 13, 25Not available
2025/0059,050 COLLOIDAL SILICA AND PRODUCTION METHOD THEREFORDec 23, 21Feb 20, 25FUSO CHEMICAL CO., LTD.
2025/0043,149 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING APPARATUSFeb 02, 24Feb 06, 25Not available
2025/0042,749 COLLOIDAL SILICA AND PRODUCTION METHOD THEREFORDec 23, 21Feb 06, 25FUSO CHEMICAL CO., LTD.
2025/0032,835 COMPOSITIONS COMPRISING 2,3,3,3-TETRAFLUOROPROPENE, 1,1,2,3-TETRA-CHLOROPROPENE, 2-CHLORO-3,3,3-TRIFLUOROPROPENE, OR 2-CHLORO-1,1,1,2-TETRAFLUOROPROPANEOct 10, 24Jan 30, 25THE CHEMOURS COMPANY FC, LLC
2025/0034,430 METHOD FOR PREPARING ORGANIC-INORGANIC NANOCOMPOSITE PARTICLE DISPERSION LIQUID, ORGANIC-INORGANIC NANOCOMPOSITE PARTICLE DISPERSION LIQUID, AND CHEMICAL MECHANICAL POLISHING SOLUTIONNov 30, 22Jan 30, 25Not available
2025/0034,431 METHOD FOR PREPARING CERIUM OXIDE NANOCOMPOSITE, CERIUM OXIDE NANOCOMPOSITE, AND CHEMICAL MECHANICAL POLISHING SOLUTIONNov 30, 22Jan 30, 25Not available
2025/0026,961 CMP SLURRIESOct 08, 24Jan 23, 25Fujimi Incorporated
2025/0026,971 ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLESOct 04, 24Jan 23, 25Not available
2025/0026,972 ABRASIVE ARTICLES AND METHODS OF FORMING SAMEOct 04, 24Jan 23, 25Not available
2025/0019,567 CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING POLISHING PAD GROOVE CLOGGINGJul 12, 23Jan 16, 25Not available

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