Class C23F : NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES
Subclass 1/32: Etching metallic material by chemical means Etching compositions (C23F 1/44 takes precedence) Aqueous compositions Alkaline compositions (C23F 1/42 takes precedence)
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 12107259 | Negative electrode comprising a protective layer for a lithium secondary battery, method for manufacturing same, and lithium secondary battery including same | Mar 05, 20 | Oct 01, 24 | LG ENERGY SOLUTION, LTD.; IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY); |
| 12040195 | Atomic layer etching | Jan 18, 23 | Jul 16, 24 | ASM IP Holding B.V. |
| 11946148 | Hafnium oxide corrosion inhibitor | Jan 10, 20 | Apr 02, 24 | VERSUM MATERIALS US, LLC |
| 11908938 | Substrate processing liquid for etching a metal layer, substrate processing method and substrate processing apparatus | Mar 04, 21 | Feb 20, 24 | SCREEN Holdings Co., Ltd. |
| 11574813 | Atomic layer etching | Dec 07, 20 | Feb 07, 23 | ASM IP Holding B.V. |
| 11235498 | Manufacturing method of metal-polymer resin bonded component | Aug 21, 18 | Feb 01, 22 | PLASTAL CO., LTD. |
| 11219948 | Method allowing the removal of oxides present on the surface of nodules of a metal powder before using same in an industrial method | Jul 08, 16 | Jan 11, 22 | AddUp |
| 10954800 | Fluidic machining method and system | Aug 10, 18 | Mar 23, 21 | RAYTHEON TECHNOLOGIES CORPORATION |
| 10643835 | Substrate processing apparatus, liquid processing method, and storage medium | Mar 21, 17 | May 05, 20 | Tokyo Electron Limited |
| 10490417 | Etching composition | Mar 17, 15 | Nov 26, 19 | Fujifilm Electronic Materials U.S.A., Inc. |
| 10446921 | Composite material, shell for mobile device, their manufacturing methods, and mobile device | Dec 01, 15 | Oct 15, 19 | BYD Company Limited |
| 10107110 | Fluidic machining method and system | Nov 14, 14 | Oct 23, 18 | United Technologies Corporation |
| 10060037 | Method for preserving a mark on a metallic workpiece | Apr 25, 16 | Aug 28, 18 | Not available |
| 10026565 | Switch contact element and its preparation method | Nov 12, 14 | Jul 17, 18 | NANTONG MEMTECH TECHNOLOGY CO., LTD. |
| 9903020 | Generation of compact alumina passivation layers on aluminum plasma equipment components | Sep 15, 14 | Feb 27, 18 | APPLIED MATERIALS, INC. |
| 9885117 | Conditioned semiconductor system parts | Feb 11, 15 | Feb 06, 18 | APPLIED MATERIALS, INC. |
| 9797048 | Stripping solution for zinc/nickel alloy plating from metal substrate | Mar 31, 15 | Oct 24, 17 | THE BOEING COMPANY |
| 9633865 | Low-stain polishing composition | Feb 22, 08 | Apr 25, 17 | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
| 9493878 | Surface roughening agent for aluminum, and surface roughening method using said surface roughening agent | Nov 08, 10 | Nov 15, 16 | MEC COMPANY LTD. |
| 9070625 | Selective etch chemistry for gate electrode materials | Mar 14, 13 | Jun 30, 15 | GLOBALFOUNDRIES INC. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2022/0064,803 | Hafnium Oxide Corrosion Inhibitor | Jan 10, 20 | Mar 03, 22 | VERSUM MATERIALS US, LLC |
| 2018/0355,490 | METHOD FOR PRESERVING A MARK ON A METALLIC WORKPIECE | Apr 22, 18 | Dec 13, 18 | Not available |
| 2018/0265,989 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD | Sep 11, 17 | Sep 20, 18 | TOSHIBA MEMORY CORPORATION |
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