Class G03D : APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS
Subclass 5/00: Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected (G03D 9/00, G03D 11/00 take precedence; application of liquids in general B05)
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 11747734 | Stripping-solution machine and working method thereof | Dec 24, 19 | Sep 05, 23 | TCL China Star Optoelectronics Technology Co.,Ltd. |
| 10763137 | Substrate processing apparatus and method of manufacturing semiconductor device | Aug 16, 19 | Sep 01, 20 | Kokusai Electric Corporation |
| 10754251 | Development unit, substrate processing apparatus, development method and substrate processing method | Feb 03, 17 | Aug 25, 20 | SCREEN Holdings Co., Ltd. |
| 10698313 | Apparatus and method for developing a photoresist coated substrate | Nov 02, 18 | Jun 30, 20 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 10615058 | Apparatus for field guided acid profile control in a photoresist layer | Mar 02, 17 | Apr 07, 20 | APPLIED MATERIALS, INC. |
| 10591820 | Substrate processing apparatus and substrate processing method | Feb 03, 17 | Mar 17, 20 | SCREEN Holdings Co., Ltd. |
| 10534267 | Lithography patterning with flexible solution adjustment | Jul 30, 18 | Jan 14, 20 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 10520819 | Substrate treating apparatus and method of treating substrate | May 23, 18 | Dec 31, 19 | Samsung Display Co., Ltd. |
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Aug 31, 17 | Nov 12, 19 | Applied Materials Inc. |
| 10418242 | Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers | Sep 15, 15 | Sep 17, 19 | Tokyo Electron Limited |
| 10289005 | Unit for supplying liquid, apparatus for treating a substrate, and method for treating a substrate | Apr 13, 18 | May 14, 19 | SEMES CO., LTD. |
| 10139732 | Substrate processing apparatus, substrate processing method and recording medium | Mar 30, 18 | Nov 27, 18 | Tokyo Electron Limited |
| 10139731 | Conveyor, developing system and method | Oct 19, 17 | Nov 27, 18 | BOE Technology Group Co. Ltd.; BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.; |
| 10108111 | Developing method, developing apparatus, and storage medium | Mar 27, 18 | Oct 23, 18 | Tokyo Electron Limited |
| 10047441 | Substrate processing apparatus and substrate processing method | Oct 26, 17 | Aug 14, 18 | SCREEN Semiconductor Solutions Co., Ltd. |
| 9978619 | Substrate processing apparatus, substrate processing method and storage medium | Mar 09, 16 | May 22, 18 | Tokyo Electron Limited |
| 9897919 | Substrate liquid treatment apparatus, substrate liquid treatment method and storage medium | Aug 03, 16 | Feb 20, 18 | TOKYO ELECTRON LIMITED |
| 9828676 | Substrate processing apparatus and substrate processing method | Jun 17, 16 | Nov 28, 17 | SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. |
| 9817323 | Liquid treatment apparatus and method and non-transitory storage medium | Feb 10, 16 | Nov 14, 17 | TOKYO ELECTRON LIMITED |
| 9690185 | Substrate processing method, program, computer-readable storage medium, and substrate processing system | Feb 11, 15 | Jun 27, 17 | TOKYO ELECTRON LIMITED |
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