Class G03D : APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS
Subclass 5/04: Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected (G03D 9/00, G03D 11/00 take precedence; application of liquids in general B05) using liquid sprays
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 10170345 | Substrate processing apparatus | Jun 30, 17 | Jan 01, 19 | Ebara Corporation |
| 8722135 | Method for discharging chemical solution | Jul 23, 10 | May 13, 14 | Semiconductor Energy Laboratory Co., Ltd. |
| 8443513 | Substrate processing apparatus | Sep 30, 10 | May 21, 13 | TOKYO ELECTRON LIMITED |
| 8408158 | Coating/developing device and method | Mar 09, 06 | Apr 02, 13 | TOKYO ELECTRON LIMITED |
| 8313257 | Coating and developing apparatus, substrate processing method, and storage medium | May 09, 11 | Nov 20, 12 | TOKYO ELECTRON LIMITED |
| 7997813 | Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium | Mar 28, 08 | Aug 16, 11 | TOKYO ELECTRON LIMITED |
| 7955011 | Coating and developing apparatus, substrate processing method, and storage medium | Apr 10, 07 | Jun 07, 11 | TOKYO ELECTRON LIMITED |
| 7766566 | Developing treatment apparatus and developing treatment method | Jul 31, 06 | Aug 03, 10 | TOKYO ELECTRON LIMITED |
| 7001086 | Developing method, substrate treating method, and substrate treating apparatus | Oct 21, 04 | Feb 21, 06 | TOSHIBA MEMORY CORPORATION |
| 6715943 | Solution treatment method and solution treatment unit | Oct 31, 01 | Apr 06, 04 | TOKYO ELECTRON LIMITED |
| 6688784 | Parallel plate development with multiple holes in top plate for control of developer flow and pressure | Oct 10, 01 | Feb 10, 04 | ADVANCED MICRO DEVICES, INC. |
| 6419408 | Developing process and developing unit | Mar 05, 99 | Jul 16, 02 | TOKYO ELECTRON LIMITED |
| 6086269 | Method and apparatus for applying a substance to a surface | May 05, 98 | Jul 11, 00 | INFINEON TECHNOLOGIES AG |
| 5854953 | Method for developing treatment | May 07, 97 | Dec 29, 98 | TOKYO ELECTRON LIMITED |
| 5842075 | Developing solution feed system for semiconductor photolithography process having a gas removal device in a high solution feed pressure pipe section | Sep 12, 97 | Nov 24, 98 | SAMSUNG ELECTRONICS CO., LTD. |
| 5815762 | Processing apparatus and processing method | Jun 19, 97 | Sep 29, 98 | TOKYO ELECTRON LIMITED |
| 5664255 | Photographic printing and processing apparatus | May 29, 96 | Sep 02, 97 | EASTMAN KODAK COMPANY |
| 5470392 | Semiconductor device processing method | Nov 14, 94 | Nov 28, 95 | RENESAS ELECTRONICS CORPORATION |
| 5436118 | Method of processing silver halide photographic elements using a low volume thin tank processing system | Mar 31, 94 | Jul 25, 95 | EASTMAN KODAK COMPANY |
| 5202716 | Resist process system | Jun 25, 92 | Apr 13, 93 | TOKYO ELECTRON LIMITED |
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