G03F 1/20

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/20: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
11940724 Reticle processing systemDec 03, 20Mar 26, 24Applied Materials Inc.
11803683 Method of and system for manufacturing semiconductor deviceJun 08, 21Oct 31, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11740546 Multi charged particle beam writing apparatus and method of adjusting sameMar 07, 22Aug 29, 23NuFlare Technology, Inc.
11556052 Using mask fabrication models in correction of lithographic masksNov 04, 20Jan 17, 23Synopsys, Inc.
11548844 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming processMay 21, 19Jan 10, 23Shin-Etsu Chemical Co. Ltd.
11370662 Hexagonal boron nitride structuresDec 21, 18Jun 28, 22Agilent Technologies Texas Instruments Incorporated
11281091 PhotomaskNov 25, 19Mar 22, 22Taiwan Semiconductor Manufacturing Co., Ltd.
11187981 Resist composition and method of forming resist patternDec 14, 18Nov 30, 21Tokyo Ohka Kogyo Co. LTD
11119399 Mask blank, phase shift mask and method for manufacturing semiconductor deviceSep 08, 16Sep 14, 21501 Hoya Corporation
10997355 Design-rule checking for curvilinear device featuresOct 31, 19May 04, 21GLOBALFOUNDRIES U.S. INC.
10901313 Division maskSep 11, 17Jan 26, 21Samsung Display Co., Ltd.
10872659 Memory system having write assist circuit including memory-adapted transistorsFeb 03, 20Dec 22, 20TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
10834828 Creating inductors, resistors, capacitors and other structures in printed circuit board vias with light pipe technologyJan 26, 18Nov 10, 20International Business Machine Corporation
10705420 Mask bias approximationMay 15, 18Jul 07, 20ASML US, LLC
10578960 Mask blank with resist film and method for manufacturing the same and method for manufacturing transfer maskJul 27, 15Mar 03, 20501 Hoya Corporation
10558116 Method for preparing synthetic quartz glass substrateJun 07, 16Feb 11, 20Shin-Etsu Chemical Co. Ltd.
10553275 Device having write assist circuit including memory-adapted transistors and method for making the sameApr 10, 18Feb 04, 20TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
10534214 Display panel and mask for manufacturing process of display panelDec 20, 17Jan 14, 20HKC CORPORATION LIMITED; Chongqing HKC Optoelectronics Technology Co., Ltd.;
10534255 Method of applying vertex based corrections to a semiconductor designDec 22, 15Jan 14, 20ASELTA NANOGRAPHICS
10488749 Photomask and method of forming the sameMar 28, 17Nov 26, 19Taiwan Semiconductor Manufacturing Co., Ltd.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2024/0036,456 METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASKJul 27, 23Feb 01, 24Not available
2024/0027,889 METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMSNov 30, 21Jan 25, 24Not available
2024/0004,282 Structured Film and Method of Using Same to Form a Pattern on a SubstrateDec 15, 21Jan 04, 24Not available
2021/0173,295 RETICLE PROCESSING SYSTEMDec 03, 20Jun 10, 21Applied Materials Inc.
2020/0227,235 Charged Particle Beam Lithography SystemJan 15, 20Jul 16, 20Not available
2019/0204,727 PHOTORESIST AND PREPARATION METHOD THEREOFMay 31, 18Jul 04, 19Not available
2018/0074,394 DIVISION MASKSep 11, 17Mar 15, 18SAMSUNG DISPLAY CO., LTD.
2017/0285,457 LASER ABLATION TOOLING VIA SPARSE PATTERNED MASKSJun 21, 17Oct 05, 17Not available

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