G03F 1/22

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/22: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
11927879 Extreme ultraviolet (EUV) photomask and method of manufacturing semiconductor device using the sameAug 20, 21Mar 12, 24Samsung Electronics Co. Ltd.
11921420 Method and system for reticle enhancement technologyJan 20, 23Mar 05, 24D2S, Inc.
11914286 Pellicle assembly and method for advanced lithographyApr 04, 22Feb 27, 24TAIWAN SEMICONDUCTORMANUFACTURING COMPANY, LTD.
11898970 EUV mask inspection device using multilayer reflection zone plateJan 07, 22Feb 13, 24ESOL Inc.
11892767 Stud attachment device and stud attachment method with independent temperature/pressure controlMar 24, 21Feb 06, 24Samsung Electronics Co. Ltd.
11860532 Photomask including fiducial mark and method of making a semiconductor device using the photomaskJul 26, 22Jan 02, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11852583 Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the methodMar 07, 23Dec 26, 23Samsung Electronics Co., Ltd.
11852966 Lithography mask with a black border regions and method of fabricating the sameJun 07, 21Dec 26, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11835864 Multi-function overlay marks for reducing noise and extracting focus and critical dimension informationJul 29, 22Dec 05, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11837486 Reticle transportation containerApr 16, 21Dec 05, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11815808 Method for high numerical aperture thru-slit source mask optimizationOct 03, 19Nov 14, 23ASML NETHERLANDS B.V.
11796922 Method of manufacturing semiconductor devicesSep 30, 19Oct 24, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11789355 Extreme ultraviolet mask and method of manufacturing the sameMar 29, 21Oct 17, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11789356 Method of manufacturing EUV photo masksAug 30, 21Oct 17, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11789360 Photomask assembly and method of forming the sameJul 18, 22Oct 17, 23Taiwan Semiconductor Manufacturing Company Ltd.
11789361 Semiconductor resist composition, and method of forming patterns using the compositionJun 28, 21Oct 17, 23Samsung SDI Co., Ltd.
11784046 Method of manufacturing a semiconductor deviceJan 15, 21Oct 10, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11782339 Pellicle for an EUV lithography mask and a method of manufacturing thereofMay 24, 21Oct 10, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11774844 Extreme ultraviolet mask and method of manufacturing the sameMar 14, 22Oct 03, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11768431 Method of fast surface particle and scratch detection for EUV mask backsideNov 10, 20Sep 26, 23Taiwan Semiconductor Manufacturing Co., Ltd.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2024/0118,614 MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WITH INTERMEDIATE FREEZE STEPSDec 20, 23Apr 11, 24Not available
2024/0112,913 Mask for X-Ray Lithography and MetrologyOct 03, 23Apr 04, 24Not available
2024/0094,620 EUV TRANSMISSIVE MEMBRANE, METHOD OF USE THEREOF, AND EXPOSURE METHODOct 10, 23Mar 21, 24NGK INSULATORS, LTD.
2024/0069,427 PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOFMar 02, 23Feb 29, 24Not available
2024/0036,462 PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOFFeb 24, 23Feb 01, 24Not available
2024/0019,787 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESJul 19, 23Jan 18, 24Not available
2024/0012,340 Multi-Function Overlay Marks for Reducing Noise and Extracting Focus and Critical Dimension InformationAug 07, 23Jan 11, 24Not available
2023/0400,758 EXTREME ULTRAVIOLET (EUV) PHOTOMASKMay 15, 23Dec 14, 23Samsung Electronics Co., Ltd.
2023/0393,456 ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHYAug 07, 23Dec 07, 23LINTEC OF AMERICA, INC.
2023/0367,192 METHOD OF FAST SURFACE PARTICLE AND SCRATCH DETECTION FOR EUV MASK BACKSIDEJul 24, 23Nov 16, 23Not available
2023/0367,193 METHOD OF MANUFACTURING EUV PHOTO MASKSJul 25, 23Nov 16, 23Not available
2023/0369,048 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICEJul 27, 23Nov 16, 23Not available
2023/0367,194 EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECTJun 28, 23Nov 16, 23Taiwan Semiconductor Manufacturing Company Ltd.
2023/0359,115 EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAMEJul 20, 23Nov 09, 23Not available
2023/0213,848 EUV TRANSMISSIVE MEMBRANEFeb 24, 23Jul 06, 23NGK INSULATORS, LTD.
2023/0142,180 MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEOct 14, 22May 11, 23501 Hoya Corporation
2023/0077,088 METHOD OF FORMING AN UNDERLAYER FOR EXTREME ULTRAVIOLET (EUV) DOSE REDUCTION AND STRUCTURE INCLUDING SAMEAug 31, 22Mar 09, 23Not available
2023/0019,943 PATTERN FORMATION METHOD AND PHOTOSENSITIVE HARD MASKJul 11, 22Jan 19, 23Not available
2023/0020,107 SYSTEM AND METHOD FOR INSPECTING A MASK FOR EUV LITHOGRAPHYSep 22, 22Jan 19, 23Not available
2022/0413,376 EXTREME ULTRAVIOLET LITHOGRAPHY PATTERNING WITH ASSIST FEATURESJun 25, 21Dec 29, 22Intel Corp.

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