G03F 1/32

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Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/32: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12216397 Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofOct 17, 23Feb 04, 25AGC Inc.
12213365 Display device and photomask for defining opening in the display deviceAug 24, 21Jan 28, 25Samsung Display Co., Ltd.
12204240 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskDec 22, 23Jan 21, 25AGC Inc.
12197120 Patterning device and method of use thereofJan 02, 20Jan 14, 25ASML NETHERLANDS B.V.
12197121 Phase shift mask blank, manufacturing method of phase shift mask, and phase shift maskOct 15, 21Jan 14, 25Shin-Etsu Chemical Co. Ltd.
12153338 Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceFeb 20, 20Nov 26, 24501 Hoya Corporation
12111566 Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodOct 09, 23Oct 08, 24501 Hoya Corporation
12105413 Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceOct 09, 23Oct 01, 24501 Hoya Corporation
12078921 Phase-shift reticle for use in photolithographyNov 18, 21Sep 03, 24Entegris Inc.
11971653 Photomask blank, method for producing photomask, and photomaskApr 20, 20Apr 30, 24Shin-Etsu Chemical Co. Ltd.
11940725 Phase shift blankmask and photomask for EUV lithographyDec 06, 21Mar 26, 24S&S TECH CO., LTD.
11914284 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskJul 03, 23Feb 27, 24AGC Inc.
11906898 Method of manufacturing phase shift photo masksAug 10, 20Feb 20, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11910695 Mask plate, display panel and display deviceAug 19, 21Feb 20, 24CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.; BOE Technology Group Co. Ltd.;
11899357 Lithography maskMay 17, 21Feb 13, 24Taiwan Semiconductor Manufacturing Co., Ltd.
11822229 Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofJul 22, 21Nov 21, 23AGC Inc.
11815806 Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodNov 18, 22Nov 14, 23501 Hoya Corporation
11815807 Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceNov 18, 22Nov 14, 23501 Hoya Corporation
11763061 Method of making semiconductor device and semiconductor deviceJul 28, 22Sep 19, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11720014 Mask blank, phase shift mask, and method of manufacturing semiconductor deviceFeb 06, 20Aug 08, 23501 Hoya Corporation

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0044,677 MASK BLANKOct 17, 24Feb 06, 25501 Hoya Corporation
2025/0036,021 EXTREME ULTRAVIOLET LITHOGRAPHY METHOD AND EUV PHOTOMASKJul 28, 23Jan 30, 25Not available
2024/0427,229 MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASKJun 05, 24Dec 26, 24Not available
2024/0393,675 REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEAug 07, 24Nov 28, 24501 Hoya Corporation
2024/0361,683 MASK BLANK AND PHASE SHIFT MASKMar 31, 22Oct 31, 24501 Hoya Corporation
2024/0345,468 BLANK MASK AND PHOTOMASK USING THE SAMEJun 21, 24Oct 17, 24SK enpulse Co., Ltd.
2024/0329,516 PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHYAug 25, 23Oct 03, 24S&S TECH CO., LTD.
2024/0248,389 APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAMEJan 15, 24Jul 25, 24Not available
2024/0248,390 APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAMEJan 15, 24Jul 25, 24Not available
2024/0210,814 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAMEMar 06, 24Jun 27, 24AGC INC.
2024/0184,194 MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEJan 21, 22Jun 06, 24501 Hoya Corporation
2024/0184,195 METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKSJan 12, 24Jun 06, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0152,045 PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD FOR MODIFYING PHASE SHIFT MASKMar 03, 22May 09, 24Not available
2024/0134,268 LITHOGRAPHY MASKJan 03, 24Apr 25, 24Not available
2024/0094,623 ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHYAug 30, 22Mar 21, 24Not available
2024/0069,431 METHOD OF MANUFACTURING PHOTO MASKSFeb 16, 23Feb 29, 24Not available
2024/0061,324 BLANK MASK AND PHOTOMASK USING THE SAMEAug 17, 23Feb 22, 24SK enpulse Co., Ltd.
2024/0053,672 MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEJan 18, 22Feb 15, 24501 Hoya Corporation
2024/0027,892 METHOD OF MAKING A HARD DISK DRIVE WRITE POLE USING A TRI-TONE ATTENUATED PHASE SHIFT MASKJul 22, 22Jan 25, 24Not available
2023/0418,150 BLANK MASK AND PHOTOMASK USING THE SAMEJun 23, 23Dec 28, 23SK enpulse Co., Ltd.

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