H01L 21/027

Sub-Class

Watch 40Status Updates

Stats

Description

Class  H01L : SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR


Subclass 21/027: Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof Manufacture or treatment of semiconductor devices or of parts thereof Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L 21/18 or H01L 21/34

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
10566184 Process of depositing silicon nitride (SiN) film on nitride semiconductorMar 30, 18Feb 18, 20Sumitomo Electric Industries Ltd.
10566332 Semiconductor devicesNov 15, 18Feb 18, 20Micron Technology Inc.
10564554 System and method for analyzing printed masks for lithography based on representative contoursJan 18, 18Feb 18, 20Globalfoundries Inc.
10566246 Shared contact trench comprising dual silicide layers and dual epitaxial layers for source/drain layers of NFET and PFET devicesAug 17, 18Feb 18, 20International Business Machine Corporation
10566473 Compound semiconductor solar cell and method of manufacturing the sameApr 24, 18Feb 18, 20LG Electronics Inc.
10562223 Imprint deviceOct 17, 16Feb 18, 20Japan as represented by Director General of National Institute of Advanced Industrial Science and Technology Ministry of Economy Trade and Industry
10564549 Photoresist stripping apparatus, and methods of stripping photoresist and forming thin film pattern using the sameAug 31, 17Feb 18, 20Samsung Display Co., Ltd.
10566344 Method of manufacturing semiconductor device using exposure mask having light transmission holes to transfer slit shaped pattern to stack structureMay 18, 18Feb 18, 20SK Hynix Inc.
10566245 Method of fabricating gate all around semiconductor deviceDec 26, 17Feb 18, 20Samsung Electronics Co., Ltd.
10564097 Chemical sensors based on plasmon resonance in grapheneAug 01, 16Feb 18, 20International Business Machine Corporation
10562991 Developer, pattern forming method, and electronic device manufacturing methodDec 21, 17Feb 18, 20FUJIFILM Corporation
10559503 Methods, apparatus and system for a passthrough-based architectureOct 09, 17Feb 11, 20Globalfoundries Inc.
10559467 Selective gas etching for self-aligned pattern transferJun 06, 18Feb 11, 20International Business Machine Corporation
10553607 Method of forming an array of elevationally-extending strings of programmable memory cells and method of forming an array of elevationally-extending strings of memory cellsAug 24, 18Feb 04, 20Micron Technology Inc.
10553700 Gate cut in RMGMay 29, 18Feb 04, 20International Business Machine Corporation
10551741 Method of forming a directed self-assembled layer on a substrateApr 07, 17Feb 04, 20ASM IP Holding B.V.; IMEC vzw;
10553724 Array substrate, method for manufacturing the same, and display deviceAug 09, 17Feb 04, 20BOE Technology Group Co. Ltd.; HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.;
10551733 Mask blanks, phase shift mask, and method for manufacturing semiconductor deviceJan 19, 16Feb 04, 20501 Hoya Corporation
10553719 Semiconductor devices and fabrication method thereofMay 05, 16Feb 04, 20Semiconductor Manufacturing International (Shanghai) Corporation
10551696 Method of producing metal electrode, array substrate and method of producing the same, display deviceMay 03, 18Feb 04, 20BOE Technology Group Co. Ltd.; BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.;

more results

Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2020/0058,492 MODIFICATION OF SNO2 SURFACE FOR EUV LITHOGRAPHYAug 14, 18Feb 20, 20Not available
2020/0058,509 LOCATION-SPECIFIC TUNING OF STRESS TO CONTROL BOW TO CONTROL OVERLAY IN SEMICONDUCTOR PROCESSINGOct 23, 19Feb 20, 20Not available
2020/0051,774 CHARGED PARTICLE BEAM OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHODMar 16, 17Feb 13, 20Nikon Corporation
2020/0043,717 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEJun 01, 17Feb 06, 20Mitsubishi Electric Corporation
2020/0027,723 METHOD FOR MANUFACTURING DEVICEDec 28, 18Jan 23, 20KABUSHIKI KAISHA TOSHIBA; Toshiba Electronic Devices & Storage Corporation;
2020/0006,053 TOOLS AND METHODS FOR PRODUCING NANOANTENNA ELECTRONIC DEVICESSep 10, 19Jan 02, 20Not available
2019/0393,026 METHOD FOR FABRICATING PATTERN OF CURED PRODUCT AND METHODS FOR MANUFACTURING OPTICAL COMPONENT, CIRCUIT BOARD AND QUARTZ MOLD REPLICA AS WELL AS COATING MATERIAL FOR IMPRINT PRETREATMENT AND CURED PRODUCT THEREOFAug 29, 19Dec 26, 19Not available
2019/0385,837 ADHESION LAYERS FOR EUV LITHOGRAPHYJun 12, 19Dec 19, 19Not available
2019/0378,712 LITHOGRAPHIC TECHNIQUE FOR FEATURE CUT BY LINE-END SHRINKAug 15, 19Dec 12, 19Not available
2019/0369,485 MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICENov 01, 17Dec 05, 19501 Hoya Corporation; HOYA ELECTRONICS SINGAPORE PTE. LTD.;
2019/0371,600 Photosensitive Groups in Resist LayerMay 31, 18Dec 05, 19Not available
2019/0361,352 Photoresist Stripping Composition and MethodMay 15, 19Nov 28, 19VERSUM MATERIALS US, LLC
2019/0363,111 METHOD FOR FABRICATING ARRAY SUBSTRATE MOTHERBOARD, ARRAY SUBSTRATE MOTHERBOARD AND DETECTION METHODMay 02, 18Nov 28, 19Not available
2019/0363,008 CONDUCTIVE CAP-BASED APPROACHES FOR CONDUCTIVE VIA FABRICATION AND STRUCTURES RESULTING THEREFROMDec 23, 16Nov 28, 19Not available
2019/0361,338 REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEJan 16, 18Nov 28, 19501 Hoya Corporation
2019/0355,572 LIGHT GENERATOR INCLUDING DEBRIS SHIELDING ASSEMBLY, PHOTOLITHOGRAPHIC APPARATUS INCLUDING THE LIGHT GENERATOR, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE PHOTOLITHOGRAPHIC APPARATUSDec 28, 18Nov 21, 19Not available
2019/0355,573 FILM FORMING SYSTEM, FILM FORMING METHOD, AND COMPUTER STORAGE MEDIUMJan 04, 18Nov 21, 19Not available
2019/0348,288 METHODS AND SYSTEMS FOR PATTERNING OF LOW ASPECT RATIO STACKSMay 08, 19Nov 14, 19Not available
2019/0348,279 METHOD FOR PATTERNING A MATERIAL LAYER WITH DESIRED DIMENSIONSMay 09, 18Nov 14, 19Not available
2019/0348,281 EXTREME ULTRAVIOLET LITHOGRAPHY FOR HIGH VOLUME MANUFACTURE OF A SEMICONDUCTOR DEVICEMay 09, 18Nov 14, 19Not available

more results

Top Owners in This Subclass

Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More

Patents Issued To Date - By Filing Year

Average Time to Issuance