| 9994735 | Slurry composition for polishing tungsten | Jun 22, 16 | Jun 12, 18 | KCTECH CO., LTD. |
| 9994748 | Polishing composition | Jul 17, 14 | Jun 12, 18 | Fujimi Incorporated |
| 9994737 | Slurry compounds and methods of fabricating semiconductor devices using the same | Dec 23, 16 | Jun 12, 18 | Samsung Electronics Co., Ltd. |
| 9994736 | Slurry composition for chemical mechanical polishing of GE-based materials and devices | Dec 15, 16 | Jun 12, 18 | Taiwan Semiconductor Manufacturing Company, Ltd.; UWIZ Technology Co., Ltd.; |
| 9991127 | Method of fabricating integrated circuit device by using slurry composition | Oct 06, 16 | Jun 05, 18 | SAMSUNG ELECTRONICS CO., LTD.; K.C. Tech Co. Ltd.; |
| 9988573 | Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate | Nov 21, 11 | Jun 05, 18 | Hitachi Chemical Company, Ltd. |
| 9982166 | Metal oxide-polymer composite particles for chemical mechanical planarization | Dec 16, 14 | May 29, 18 | Cabot Corporation |
| 9982177 | Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same | Jan 20, 11 | May 29, 18 | Hitachi Chemical Company, Ltd. |
| 9982351 | Chemical mechanical polishing for improved contrast resolution | Jan 31, 17 | May 29, 18 | GM Global Technology Operations LLC |
| 9984895 | Chemical mechanical polishing method for tungsten | Nov 16, 17 | May 29, 18 | Rohm and Haas Electronic Materials CMP Holdings, Inc. |
| 9982165 | Polishing slurry for silicon, method of polishing polysilicon and method of manufacturing a thin film transistor substrate | Nov 18, 16 | May 29, 18 | SAMSUNG DISPLAY CO., LTD.; UBmaterials Inc.; |
| 9978609 | Low dishing copper chemical mechanical planarization | Jan 20, 16 | May 22, 18 | VERSUM MATERIALS US, LLC |
| 9969045 | Method and device for dispensing solid compound pastes for surface processing, and related surface processing method and system | Apr 14, 17 | May 15, 18 | MENZERNA POLISHING COMPOUNDS GMBH & CO. KG |
| 9963634 | Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same | Nov 14, 12 | May 08, 18 | Shin-Etsu Chemical Co. Ltd. |
| 9966269 | Polishing liquid for CMP, polishing liquid set for CMP, and polishing method | May 29, 15 | May 08, 18 | Hitachi Chemical Company, Ltd. |
| 9944829 | Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC wafer | Oct 24, 16 | Apr 17, 18 | Not available |
| 9944828 | Slurry for chemical mechanical polishing of cobalt | Oct 21, 15 | Apr 17, 18 | Cabot Microelectronics Corporation |
| 9944827 | CMP polishing solution and polishing method | Jun 29, 11 | Apr 17, 18 | Hitachi Chemical Company, Ltd. |
| 9932497 | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate | Mar 26, 13 | Apr 03, 18 | Hitachi Chemical Company, Ltd. |
| 9919962 | Polishing agent for synthetic quartz glass substrate | Oct 09, 14 | Mar 20, 18 | SHIN-ETSU CHEMICAL CO., LTD. |