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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
RE49732 Charged particle lithography system with alignment sensor and beam measurement sensorMay 30, 19Nov 21, 23ASML Netherlands B.V.
RE49602 Lithography system, sensor and measuring methodSep 02, 20Aug 08, 23ASML Netherlands B.V.
RE49525 Semiconductor device having gate electrode with spacers on fin structure and silicide layer filling the recessAug 06, 20May 09, 23Samsung Electronics Co. Ltd.
RE49483 Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatusMay 16, 19Apr 04, 23ASML Netherlands B.V.
RE49404 Three axis magnetic field sensorMar 28, 17Jan 31, 23EverSpin Technologies Inc.
RE49241 Lithography system and method for processing a target, such as a waferSep 11, 19Oct 11, 22ASML Netherlands B.V.
RE48952 Recording medium controller and method thereofJan 29, 15Mar 01, 22KABUSHIKI KAISHA TOSHIBA
RE48515 Method and device for irradiating spots on a layerMay 16, 17Apr 13, 21ASML Netherlands B.V.
RE48287 Method for forming an optical fiber arrayOct 03, 18Oct 27, 20ASML Netherlands B.V.
RE48226 Cyclosporine analogue mixtures and their use as immunomodulating agentsJun 30, 14Sep 29, 20Aurinia Pharmaceuticals Inc.
RE48046 Lithography system, sensor and measuring methodAug 26, 14Jun 09, 20ASML NETHERLANDS B.V.
RE47922 Charged particle beam writing apparatus and charged particle beam writing methodJul 14, 16Mar 31, 20NuFlare Technology, Inc.
RE47767 Group III-nitride layers with patterned surfacesDec 23, 15Dec 17, 19Nokia of America Corporation
RE47707 Charged particle beam writing apparatus and charged particle beam writing methodOct 10, 16Nov 05, 19NuFlare Technology, Inc.
RE47583 Circuit selection of magnetic memory cells and related cell structuresMar 04, 15Aug 27, 19NVE Corporation
RE47561 Multi charged particle beam writing method and multi charged particle beam writing apparatusMay 09, 16Aug 06, 19NuFlare Technology, Inc.
RE47483 Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the templateOct 14, 15Jul 02, 19Molecular Imprints, Inc.; Canon Nanotechnologies, Inc.;
RE47456 Pattern transfer apparatus and method for fabricating semiconductor deviceApr 29, 16Jun 25, 19TOSHIBA MEMORY CORPORATION
RE47287 Lithography system, sensor, converter element and method of manufactureJan 22, 15Mar 12, 19Mapper Lithography IP B.V.
RE47271 Imprint recipe creating device and imprint deviceJun 03, 16Mar 05, 19TOSHIBA MEMORY CORPORATION

Showing 1 to 20 of 6553 results