H05H 1/04

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9967963 System and method for controlling plasma magnetic fieldAug 18, 15May 08, 18General Fusion Inc.
9949355 Plasma flow interaction simulatorNov 03, 16Apr 17, 18TORUS TECH LLC
9909552 Plasma generating device, and internal combustion engineJul 13, 12Mar 06, 18IMAGINEERING, INC.
9497844 Plasma flow interaction simulatorJan 08, 15Nov 15, 16TORUS TECH LLC
9192038 Target supply apparatus, control system, control apparatus and control circuit thereofOct 07, 13Nov 17, 15CKD CORPORATION, GIGAPHOTON INC.,
8933595 Plasma flow interaction simulatorMar 05, 12Jan 13, 15TORUS TECH LLC
8773020 Apparatus for forming a magnetic field and methods of use thereofApr 29, 11Jul 08, 14APPLIED MATERIALS, INC.
8581220 Target supply apparatus, control system, control apparatus and control circuit thereofDec 23, 09Nov 12, 13CKD CORPORATION, GIGAPHOTON INC., CDK Corporation,
7626188 Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiationJul 30, 07Dec 01, 09USHIO DENKI KABUSHIKI KAISHA
7476884 Device and method for generating extreme ultraviolet (EUV) radiationFeb 14, 06Jan 13, 09USHIO DENKI KABUSHIKI KAISHA
7339181 High flux, high energy photon sourceNov 07, 03Mar 04, 08POWERLASE PHOTONICS LIMITED
7157123 Plasma-enhanced film depositionDec 18, 03Jan 02, 07CARDINAL CG COMPANY
6815700 Plasma focus light source with improved pulse power systemJul 03, 02Nov 09, 04ASML NETHERLANDS B.V.
6809328 Protective coatings for radiation source componentsDec 20, 02Oct 26, 04INTEL CORPORATION
6770896 Method for generating extreme ultraviolet radiation based on a radiation-emitting plasmaFeb 03, 03Aug 03, 04USHIO DENKI KABUSHIKI KAISHA
6744060 Pulse power system for extreme ultraviolet and x-ray sourcesApr 10, 02Jun 01, 04ASML NETHERLANDS B.V.
6661018 Shroud nozzle for gas jet control in an extreme ultraviolet light sourceApr 25, 00Dec 09, 03UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC.
6566668 Plasma focus light source with tandem ellipsoidal mirror unitsJun 06, 01May 20, 03ASML NETHERLANDS B.V.
5283530 Electron acceleration systemSep 12, 91Feb 01, 94The United States of America as represented by the Secretary of the Navy
4942338 Method and apparatus for plasma containmentMar 21, 88Jul 17, 90Sam Bida