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| 9994739 | Polishing liquid and method of polishing SiC substrate | Oct 30, 15 | Jun 12, 18 | Disco Corporation |
| 9994736 | Slurry composition for chemical mechanical polishing of GE-based materials and devices | Dec 15, 16 | Jun 12, 18 | Taiwan Semiconductor Manufacturing Company, Ltd.; UWIZ Technology Co., Ltd.; |
| 9969904 | Epoxy-fortified floor polishes | Mar 16, 15 | May 15, 18 | ?Rohm and Haas Company; Dow Global Technologies LLC; |
| 9957419 | Method for producing zeta negative nanodiamond dispersion and zeta negative nanodiamond dispersion | Apr 22, 14 | May 01, 18 | Carbodeon Ltd Oy |
| 9944829 | Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC wafer | Oct 24, 16 | Apr 17, 18 | Not available |
| 9944838 | Polishing composition and method for producing same | Sep 22, 14 | Apr 17, 18 | Fujimi Incorporated |
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| 9919962 | Polishing agent for synthetic quartz glass substrate | Oct 09, 14 | Mar 20, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9909033 | Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof | Oct 03, 14 | Mar 06, 18 | RHODIA OPERATIONS |
| 9909032 | Composition and method for polishing memory hard disks | Jan 15, 14 | Mar 06, 18 | CABOT MICROELECTRONICS CORPORATION |
| 9896604 | Methods of polishing sapphire surfaces | Mar 12, 14 | Feb 20, 18 | ECOLAB USA INC. |
| 9881803 | Chemical mechanical polishing method using slurry composition containing N-oxide compound | Jul 21, 16 | Jan 30, 18 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., UWIZ TECHNOLOGY CO., LTD., |
| 9878420 | Method of chemical mechanical polishing of alumina | Nov 02, 16 | Jan 30, 18 | Sinmat, Inc., UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC., |
| 9845408 | Coating compositions having chelant functionality | Feb 22, 13 | Dec 19, 17 | ROHM AND HAAS COMPANY |
| 9828528 | Polishing composition containing ceria abrasive | Oct 31, 16 | Nov 28, 17 | CABOT MICROELECTRONICS CORPORATION |
| 9803106 | Methods for fabricating a chemical-mechanical polishing composition | Jun 25, 15 | Oct 31, 17 | CABOT MICROELECTRONICS CORPORATION |
| 9803108 | Aqueous compositions of stabilized aminosilane group containing silica particles | Oct 19, 16 | Oct 31, 17 | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
| 9803109 | CMP composition for silicon nitride removal | Feb 03, 15 | Oct 31, 17 | CABOT MICROELECTRONICS CORPORATION |
| 9783702 | Aqueous compositions of low abrasive silica particles | Oct 19, 16 | Oct 10, 17 | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |