C09G 1/00

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9962811 Method and blasting means for producing a sanitized finish on an aluminum substrateSep 10, 12May 08, 18VULKAN INOX GMBH
9944829 Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC waferOct 24, 16Apr 17, 18Not available
9907742 Consumer goods product comprising functionalised lignin oligomerJun 22, 16Mar 06, 18The Procter & Gamble Company
9909032 Composition and method for polishing memory hard disksJan 15, 14Mar 06, 18CABOT MICROELECTRONICS CORPORATION
9907744 Consumer goods product comprising lignin oligomerJun 22, 16Mar 06, 18The Procter & Gamble Company
9902812 Consumer goods product comprising functionalised lignin oligomerJun 22, 16Feb 27, 18The Procter & Gamble Company
9901526 Consumer goods product comprising functionalised lignin oligomerJun 22, 16Feb 27, 18The Procter & Gamble Company
9895445 Consumer goods product comprising functionalised lignin oligomerJun 22, 16Feb 20, 18The Procter & Gamble Company
9879156 Polishing compositionFeb 07, 14Jan 30, 18FUJIMI INCORPORATED
9828528 Polishing composition containing ceria abrasiveOct 31, 16Nov 28, 17CABOT MICROELECTRONICS CORPORATION
9803106 Methods for fabricating a chemical-mechanical polishing compositionJun 25, 15Oct 31, 17CABOT MICROELECTRONICS CORPORATION
9803108 Aqueous compositions of stabilized aminosilane group containing silica particlesOct 19, 16Oct 31, 17ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
9803109 CMP composition for silicon nitride removalFeb 03, 15Oct 31, 17CABOT MICROELECTRONICS CORPORATION
9782467 Capsular polysaccharide solubilisation and combination vaccinesJan 20, 09Oct 10, 17GLAXOSMITHKLINE BIOLOGICALS SA
9783702 Aqueous compositions of low abrasive silica particlesOct 19, 16Oct 10, 17ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
9758697 Polishing composition containing cationic polymer additiveMar 05, 15Sep 12, 17CABOT MICROELECTRONICS CORPORATION
9685341 Abrasive composition and method for producing semiconductor substrateMar 12, 13Jun 20, 17FUJIMI INCORPORATED
9666496 Systems and methods for chemical mechanical planarization with photoluminescence quenchingSep 16, 15May 30, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9528031 Slurry composition and method of substrate polishingApr 25, 14Dec 27, 16CABOT MICROELECTRONICS CORPORATION, NIHON CABOT MICROELECTRONICS K.K.,
9505952 Polishing composition containing ceria abrasiveMar 05, 15Nov 29, 16CABOT MICROELECTRONICS CORPORATION

Showing 1 to 20 of 84 results