C23F 1/10

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9994735 Slurry composition for polishing tungstenJun 22, 16Jun 12, 18KCTECH CO., LTD.
9981362 Apparatus and methods for high pressure leaching of polycrystalline diamond cutter elementsDec 30, 13May 29, 18NATIONAL OILWELL VARCO, L.P.
9909037 Etching adhesive tape, method of manufacturing the same and etching methodAug 12, 16Mar 06, 18BOE TECHNOLOGY GROUP CO., LTD., HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.,
9633898 Etching liquid, etching method, and method of manufacturing solder bumpOct 22, 15Apr 25, 17EBARA CORPORATION
9580818 Etching liquid for film of multilayer structure containing copper layer and molybdenum layerMay 27, 11Feb 28, 17MITSUBISHI GAS CHEMICAL COMPANY, INC.
9305794 Etching method and etching compositionApr 07, 14Apr 05, 16MACRONIX INTERNATIONAL CO., LTD.
9180520 Method of processing a composite bodyOct 05, 12Nov 10, 15ELEMENT SIX ABRASIVES S.A.
8894876 Etchant for electrode and method of fabricating thin film transistor array panel using the sameAug 17, 10Nov 25, 14SAMSUNG DISPLAY CO., LTD., SOULBRAIN CO., LTD., TECHNO SEMICHEM CO., LTD.,
8540852 Method and apparatus for manufacturing magnetoresistive devicesSep 13, 06Sep 24, 13CANON ANELVA CORPORATION
8298372 Quartz window having gas feed and processing equipment incorporating sameApr 14, 10Oct 30, 12APPLIED MATERIALS, INC.
7789979 Shape memory alloy articles with improved fatigue performance and methods thereforMay 02, 03Sep 07, 10W. L. GORE & ASSOCIATES, INC.
7264742 Method of planarizing a surfaceAug 17, 04Sep 04, 07MICRON TECHNOLOGY, INC.
7156950 Gas diffusion plate for use in ICP etcherJan 21, 03Jan 02, 07JUSUNG ENGINEERING CO., LTD.
6982062 Corrosion inhibiting compositionJul 22, 03Jan 03, 06SOLENIS TECHNOLOGIES, L.P.
6838011 Method of processing PFC and apparatus for processing PFCMar 13, 01Jan 04, 05SEIKO EPSON CORPORATION
6827871 Ruthenium and ruthenium dioxide removal method and materialDec 18, 02Dec 07, 04MICRON TECHNOLOGY, INC.
6716762 Plasma confinement by use of preferred RF return pathApr 08, 03Apr 06, 04LAM RESEARCH CORPORATION
6635185 Method of etching and cleaning using fluorinated carbonyl compoundsDec 31, 97Oct 21, 03AlliedSignal Inc.
6605176 Aperture for linear control of vacuum chamber pressureJul 13, 01Aug 12, 03TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
6592673 Apparatus and method for detecting a presence or position of a substrateMay 27, 99Jul 15, 03APPLIED MATERIALS, INC.

Showing 1 to 20 of 27 results