G03F 1/32

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9989857 Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomaskSep 09, 15Jun 05, 18Samsung Electronics Co., Ltd.
9971238 Mask blank, phase shift mask, and production method thereofJan 29, 15May 15, 18Dai Nippon Printing Co., Ltd.
9952498 Mask blank, and transfer maskSep 21, 16Apr 24, 18501 Hoya Corporation
9946153 Mask blank and transfer maskSep 19, 16Apr 17, 18501 Hoya Corporation
9939723 Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor deviceFeb 24, 15Apr 10, 18501 Hoya Corporation
9933698 Mask blank, phase-shift mask and method for manufacturing semiconductor deviceDec 09, 14Apr 03, 18501 Hoya Corporation
9927695 Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure methodMar 23, 16Mar 27, 18Shin-Etsu Chemical Co. Ltd.
9897911 Halftone phase shift photomask blank, making method, and halftone phase shift photomaskAug 09, 16Feb 20, 18SHIN-ETSU CHEMICAL CO., LTD.
9885950 Phase shift mask, method for manufacturing the same, and method for forming micro patternApr 20, 15Feb 06, 18SAMSUNG DISPLAY CO., LTD.
9880426 Display panel and manufacturing method thereof, mask and manufacturing method thereof, and display deviceJun 26, 13Jan 30, 18BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,
9874808 Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using sameAug 21, 14Jan 23, 18DAI NIPPON PRINTING CO., LTD.
9864268 Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceMar 30, 15Jan 09, 18HOYA CORPORATION
9864269 Photomask blankAug 17, 16Jan 09, 18SHIN-ETSU CHEMICAL CO., LTD.
9778558 Mask for photolithography, method of manufacturing the same and method of manufacturing substrate using the sameJun 26, 15Oct 03, 17SAMSUNG DISPLAY CO., LTD., INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY,
9778559 Method for preparing halftone phase shift photomask blankMar 23, 16Oct 03, 17SHIN-ETSU CHEMICAL CO., LTD.
9778560 Method for preparing halftone phase shift photomask blankMar 23, 16Oct 03, 17SHIN-ETSU CHEMICAL CO., LTD.
9741828 Mask, manufacturing method thereof and manufacturing method of a thin film transistorDec 11, 14Aug 22, 17BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.,
9726972 Mask blank, transfer mask, and method for manufacturing transfer maskAug 15, 14Aug 08, 17HOYA CORPORATION
9709885 Photomask blank and method for manufacturing photomask blankOct 03, 16Jul 18, 17SHIN-ETSU CHEMICAL CO., LTD.
9651857 Mask and method for forming the sameMar 03, 15May 16, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Showing 1 to 20 of 58 results