G03F 1/40

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9760011 Pattern trimming compositions and methodsMar 07, 16Sep 12, 17ROHM AND HAAS ELECTRONIC MATERIALS LLC
9442364 Mask blank for reflection-type exposure, and mask for reflection-type exposureMar 21, 14Sep 13, 16TOPPAN PRINTING CO., LTD.
9383639 MaskJul 30, 14Jul 05, 16BEIJING BOE DISPLAY TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.,
9298080 Mask for performing pattern exposure using reflected lightMay 20, 15Mar 29, 16RENESAS ELECTRONICS CORPORATION
9280045 Mask blank and photomaskOct 15, 13Mar 08, 16CLEAN SURFACE TECHNOLOGY CO.
9256121 Mask plate and a method for producing a substrate markSep 30, 14Feb 09, 16BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,
9069254 Method of manufacturing semiconductor device, and maskMay 20, 13Jun 30, 15RENESAS ELECTRONICS CORPORATION
8771905 Exposure mask and method for manufacturing same and method for manufacturing semiconductor deviceJun 08, 12Jul 08, 14TOSHIBA MEMORY CORPORATION
8772737 Conductive element for electrically coupling an EUVL mask to a supporting chuckSep 20, 12Jul 08, 14APPLIED MATERIALS ISRAEL, LTD.
8742376 Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the maskMay 29, 13Jun 03, 14NUFLARE TECHNOLOGY, INC.
8502516 Voltage adjustment module and power supply deviceNov 09, 10Aug 06, 13WISTRON CORPORATION
8383301 Methods of fabricating reticles with subdivided blocking regionsNov 29, 11Feb 26, 13MICRON TECHNOLOGY, INC.
8293431 Lithographic mask and method of forming a lithographic maskApr 16, 10Oct 23, 12Advanced Mask Technology Center GmbH & Co. KG
8216744 Exposure mask and method for manufacturing same and method for manufacturing semiconductor deviceFeb 04, 10Jul 10, 12TOSHIBA MEMORY CORPORATION
6747442 Multiphase integrated DC-to-DC voltage converterFeb 19, 02Jun 08, 04NXP B.V.