| 2025/0033,081 | METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWELRY AND GEM STONES | May 20, 24 | Jan 30, 25 | Not available |
| 2024/0327,677 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER | Jun 04, 24 | Oct 03, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0254,273 | POLYURETHANES, POLISHING ARTICLES AND POLISHING SYSTEMS THEREFROM AND METHOD OF USE THEREOF | May 27, 22 | Aug 01, 24 | Not available |
| 2024/0246,853 | CHEMICAL LIQUID STORAGE BODY | Apr 05, 24 | Jul 25, 24 | FUJIFILM Corporation |
| 2016/0108,284 | POLISHING COMPOSITION | May 01, 14 | Apr 21, 16 | FUJIMI INCORPORATED |
| 2013/0112,908 | FLUOROPHOSPHATE SURFACTANTS | Feb 20, 12 | May 09, 13 | THE CHEMOURS COMPANY FC, LLC |
| 2012/0255,651 | FLUOROALKYLALKOXYLATES | Apr 07, 11 | Oct 11, 12 | E. I. DU PONT DE NEMOURS AND COMPANY |
| 2012/0230,925 | STABILIZATION OF HOUSEHOLD, BODY-CARE AND FOOD PRODUCTS BY USING BENZOTROPOLONE CONTAINING PLANT EXTRACTS AND/OR RELATED BENZOTROPOLONE DERIVATIVES | Oct 05, 10 | Sep 13, 12 | BASF SE |
| 2010/0267,843 | MIXED FLUOROALKYL-ALKYL SURFACTANTS | Apr 12, 10 | Oct 21, 10 | THE CHEMOURS COMPANY FC, LLC |
| 2009/0318,063 | Polishing systems | Jun 18, 09 | Dec 24, 09 | CABOT MICROELECTRONICS CORPORATION |
| 2009/0289,217 | POLISHING COMPOSITION | Jul 26, 07 | Nov 26, 09 | SHOWA DENKO K.K. |
| 2009/0286,885 | Ethylene-tetrafluoroethylene phosphate composition | May 19, 08 | Nov 19, 09 | E. I. DU PONT DE NEMOURS AND COMPANY |
| 2009/0176,685 | CORROSION INHIBITING COMPOSITIONS | May 17, 05 | Jul 09, 09 | Not available |
| 2009/0162,308 | USE OF 2,4'-DIMETHYLPROPIOPHENONE AS A FRAGRANCE SUBSTANCE | Dec 18, 08 | Jun 25, 09 | SYMRISE AG |
| 2009/0114,117 | Leveling agent and water-based floor-polishing composition comprising the leveling agent | Aug 25, 04 | May 07, 09 | Toho Chemical Industry Co., Ltd. |
| 2007/0214,728 | METHOD OF POLISHING A TUNGSTEN-CONTAINING SUBSTRATE | Feb 01, 07 | Sep 20, 07 | CABOT MICROELECTRONICS CORPORATION |
| 2007/0218,693 | HIGH SELECTIVITY SLURRY COMPOSITIONS FOR CHEMICAL MECHANICAL POLISHING | May 18, 07 | Sep 20, 07 | APPLIED MATERIALS, INC. |
| 2007/0218,811 | CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE | Sep 25, 05 | Sep 20, 07 | HITACHI CHEMICAL COMPANY, LTD. |
| 2005/0139,119 | Polishing composition | Dec 24, 03 | Jun 30, 05 | FUJIFILM CORPORATION |
| 2005/0139,120 | Auto care compositions with UV absorbers | Nov 24, 04 | Jun 30, 05 | GOLDSCHMIDT GMBH |