C09G 1/04

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
2025/0075,105 ANTIFOAMER FOR GRINDING OR POLISHING COMPOSITIONS AND METHODS FOR USING THE SAMEOct 15, 24Mar 06, 25LaPel, LLC
2025/0066,641 POLISHING SLURRY COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAMEMar 12, 24Feb 27, 25Samsung Electronics Co., Ltd.
2025/0026,962 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAMESep 27, 24Jan 23, 25Not available
2024/0395,562 CHEMICAL MECHANICAL POLISH SLURRY AND METHOD OF MANUFACTUREJul 31, 24Nov 28, 24Not available
2024/0327,677 CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYERJun 04, 24Oct 03, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0318,039 CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEMar 13, 24Sep 26, 24Samsung Electronics Co., Ltd.
2024/0318,040 CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEMar 19, 24Sep 26, 24Not available
2024/0141,205 COMPOSITIONS AND METHODS OF USE THEREOFJan 10, 24May 02, 24Not available
2024/0076,522 POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATESep 05, 23Mar 07, 24Not available
2024/0043,721 Ruthenium CMP Chemistry Based On HalogenationOct 18, 23Feb 08, 24Not available
2024/0016,154 SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAMENov 12, 21Jan 18, 24Not available
2023/0357,601 POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATEApr 11, 23Nov 09, 23Not available
2023/0143,013 CHEMICAL PLANARIZATIONDec 30, 22May 11, 23Not available
2023/0052,829 COMPOSITIONS AND METHODS OF USE THEREOFJul 28, 22Feb 16, 23Not available
2022/0348,792 POLISHING COMPOSITIONS FOR REDUCED DEFECTIVITY AND METHODS OF USING THE SAMEJul 19, 22Nov 03, 22Not available
2022/0298,381 CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAMEMar 15, 22Sep 22, 22Not available
2022/0298,382 CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAMEMar 15, 22Sep 22, 22Not available
2022/0243,094 SILICON CARBONITRIDE POLISHING COMPOSITION AND METHODFeb 04, 22Aug 04, 22Not available
2022/0145,133 FREEZE-THAW STABLE WATER-IN-OIL EMULSION CLEANER AND/OR POLISH COMPOSITIONSJan 28, 22May 12, 22S. C. Johnson & Son, Inc.
2022/0089,911 POLISHING COMPOSITIONDec 03, 21Mar 24, 22Fujimi Incorporated

Showing 1 to 20 of 117 results