| 2025/0044,677 | MASK BLANK | Oct 17, 24 | Feb 06, 25 | 501 Hoya Corporation |
| 2025/0036,021 | EXTREME ULTRAVIOLET LITHOGRAPHY METHOD AND EUV PHOTOMASK | Jul 28, 23 | Jan 30, 25 | Not available |
| 2024/0427,229 | MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK | Jun 05, 24 | Dec 26, 24 | Not available |
| 2024/0393,675 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Aug 07, 24 | Nov 28, 24 | 501 Hoya Corporation |
| 2024/0361,683 | MASK BLANK AND PHASE SHIFT MASK | Mar 31, 22 | Oct 31, 24 | 501 Hoya Corporation |
| 2024/0345,468 | BLANK MASK AND PHOTOMASK USING THE SAME | Jun 21, 24 | Oct 17, 24 | SK enpulse Co., Ltd. |
| 2024/0329,516 | PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY | Aug 25, 23 | Oct 03, 24 | S&S TECH CO., LTD. |
| 2024/0248,389 | APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAME | Jan 15, 24 | Jul 25, 24 | Not available |
| 2024/0248,390 | APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAME | Jan 15, 24 | Jul 25, 24 | Not available |
| 2024/0210,814 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME | Mar 06, 24 | Jun 27, 24 | AGC INC. |
| 2024/0184,194 | MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | Jan 21, 22 | Jun 06, 24 | 501 Hoya Corporation |
| 2024/0184,195 | METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS | Jan 12, 24 | Jun 06, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0176,224 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Dec 22, 23 | May 30, 24 | AGC Inc. |
| 2024/0152,045 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD FOR MODIFYING PHASE SHIFT MASK | Mar 03, 22 | May 09, 24 | Not available |
| 2024/0134,268 | LITHOGRAPHY MASK | Jan 03, 24 | Apr 25, 24 | Not available |
| 2024/0094,623 | ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY | Aug 30, 22 | Mar 21, 24 | Not available |
| 2024/0069,431 | METHOD OF MANUFACTURING PHOTO MASKS | Feb 16, 23 | Feb 29, 24 | Not available |
| 2024/0061,324 | BLANK MASK AND PHOTOMASK USING THE SAME | Aug 17, 23 | Feb 22, 24 | SK enpulse Co., Ltd. |
| 2024/0053,672 | MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Jan 18, 22 | Feb 15, 24 | 501 Hoya Corporation |
| 2024/0045,319 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHOGRAPHY, AND MANUFACTURING METHODS THEREOF | Oct 17, 23 | Feb 08, 24 | AGC Inc. |