G03F 1/40

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
2024/0347,552 METHOD FOR MANUFACTURING DRIVE CIRCUIT, DRIVE CIRCUIT AND PHOTOMASKDec 30, 21Oct 17, 24HKC Corporation Limited
2024/0264,521 METHOD FOR INVERSE OPTICAL PROXIMITY CORRECTION OF SUPER-RESOLUTION LITHOGRAPHY BASED ON LEVEL SET ALGORITHMDec 28, 21Aug 08, 24Not available
2023/0138,079 LITHOGRAPHY SYSTEMJun 30, 22May 04, 23Not available
2022/0397,820 PHOTOMASK, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY PANELDec 31, 20Dec 15, 22TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
2022/0260,901 METHOD OF LITHOGRAPHY PROCESS USING RETICLE CONTAINER WITH DISCHARGING DEVICEApr 29, 22Aug 18, 22Taiwan Semiconductor Manufacturing Company Ltd.
2022/0146,924 REFLECTIVE MASK AND FABRICATING METHOD THEREOFJan 19, 22May 12, 22Taiwan Semiconductor Manufacturing Co., Ltd.
2021/0373,434 TRANSPORT COMPLEX AND TRANSPORT MODULE INCLUDING THE SAMEMar 01, 21Dec 02, 21Not available
2021/0026,236 RETICLE WITH CONDUCTIVE MATERIAL STRUCTUREOct 08, 20Jan 28, 21Taiwan Semiconductor Manufacturing Company Ltd.
2020/0371,426 ANTI-STATIC PHOTOMASKMay 22, 19Nov 26, 20Not available
2020/0233,298 PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTIONMar 04, 19Jul 23, 20Not available
2020/0192,213 SUBSTRATE WITH AN ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEFeb 20, 20Jun 18, 20501 Hoya Corporation
2019/0094,681 PHOTOETCHING MASK PLATE, MANUFACTURE METHOD THEREOF, AND PHOTOETCHING METHODJan 11, 17Mar 28, 19BOE Technology Group Co. Ltd.; BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.;
2019/0056,653 REFLECTIVE MASK BLANK AND REFLECTIVE MASKAug 07, 18Feb 21, 19AGC INC.
2018/0335,693 MASK BLANK HAVING RESIST LAYER, METHOD FOR MANUFACTURING MASK BLANK HAVING RESIST LAYER, AND METHOD FOR MANUFACTURING TRANSFER MASKNov 07, 16Nov 22, 18501 Hoya Corporation
2018/0164,676 ANTI-ESD PHOTOMASK AND METHOD OF FORMING THE SAMEJan 30, 17Jun 14, 18Not available
2018/0149,962 SUBSTRATE WITH ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEJun 08, 16May 31, 18501 Hoya Corporation
2014/0106,266 MASK BLANK AND PHOTOMASKOct 15, 13Apr 17, 14CLEAN SURFACE TECHNOLOGY CO.
2012/0070,768 RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATIONNov 29, 11Mar 22, 12MICRON TECHNOLOGY, INC.