| 2025/0102,898 | REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK | Sep 04, 24 | Mar 27, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0068,054 | Mask and Reticle Protection with Atomic Layer Deposition (ALD) | Nov 13, 24 | Feb 27, 25 | Not available |
| 2025/0036,020 | REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, REFLECTIVE MASK, AND REFLECTIVE MASK MANUFACTURING METHOD | Oct 09, 24 | Jan 30, 25 | AGC Inc. |
| 2025/0004,360 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | Sep 13, 24 | Jan 02, 25 | AGC Inc. |
| 2024/0427,228 | PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK | Jun 12, 24 | Dec 26, 24 | Kioxia Corporation |
| 2024/0393,678 | REMOVING METHOD, REMOVAL APPARATUS, IMPRINT APPARATUS, REPLICA MANUFACTURING APPARATUS, AND ARTICLE MANUFACTURING METHOD | Apr 18, 24 | Nov 28, 24 | Not available |
| 2024/0377,719 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Sep 22, 22 | Nov 14, 24 | 501 Hoya Corporation |
| 2024/0357,791 | PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED | Mar 28, 24 | Oct 24, 24 | Shanghai Huali Integrated Circuit Corporation |
| 2024/0288,763 | REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK | Jun 02, 22 | Aug 29, 24 | Not available |
| 2024/0280,890 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Apr 29, 24 | Aug 22, 24 | AGC Inc. |
| 2024/0241,433 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | Mar 29, 24 | Jul 18, 24 | AGC Inc. |
| 2024/0241,455 | ELECTRONIC DEVICE | Dec 14, 23 | Jul 18, 24 | Chimei Innolux Corporation |
| 2024/0231,214 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Feb 22, 22 | Jul 11, 24 | 501 Hoya Corporation |
| 2024/0231,219 | HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME | Sep 19, 23 | Jul 11, 24 | Samsung Electronics Co., Ltd. |
| 2024/0210,814 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME | Mar 06, 24 | Jun 27, 24 | AGC INC. |
| 2024/0184,193 | MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | May 06, 22 | Jun 06, 24 | 501 Hoya Corporation |
| 2024/0176,224 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Dec 22, 23 | May 30, 24 | AGC Inc. |
| 2024/0176,226 | METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK | Feb 05, 24 | May 30, 24 | Not available |
| 2024/0176,245 | PHOTOLITHOGRAPHY PATTERNING METHOD | Feb 07, 24 | May 30, 24 | Not available |
| 2024/0168,370 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Oct 20, 23 | May 23, 24 | AGC Inc. |