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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
2020/0051,809 APPARATUS FOR CHEMICAL MECHANICAL POLISHING PROCESSOct 21, 19Feb 13, 20Taiwan Semiconductor Manufacturing Co., Ltd.
2020/0047,306 MAGNETIC POLISHING MACHINEApr 24, 18Feb 13, 20Not available
2020/0052,567 METHOD OF MANUFACTURING MAGNET ASSEMBLY, MAGNET ASSEMBLY,VIBRATING MOTOR, AND HAPTIC DEVICEJul 09, 19Feb 13, 20Not available
2020/0049,546 SENSOR TARGET COVER USED IN COMBINATION WITH LIQUID LEVEL DETECTION SENSOR, WET PROCESSING DEVICE, SUBSTRATE PROCESSING DEVICE, AND SENSOR ASSEMBLYAug 06, 19Feb 13, 20Ebara Corporation
2020/0047,307 POLISHING LAYER AND POLISHING METHODOct 16, 19Feb 13, 20IV Technologies CO., Ltd.
2020/0047,311 METHODS AND APPARATUSMar 28, 18Feb 13, 20Not available
2020/0048,133 ARTICLES HAVING EDGES WITH COMPRESSIVE RESIDUAL STRESS AND METHODS OF FORMING THE SAMEJul 26, 19Feb 13, 20Not available
2020/0047,305 SANDING MACHINE FOR THE SANDING/FINISHING PANELS MADE OF WOOD, METAL, OR THE LIKEAug 08, 19Feb 13, 20VIET ITALIA S.R.L.
2020/0047,309 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTRATE HOLDING MECHANISM, AND SUBSTRATE HOLDING METHODOct 18, 19Feb 13, 20Not available
2020/0047,308 SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD OF MANUFACTURING THE SUBSTRATE HOLDING DEVICEOct 17, 19Feb 13, 20Not available
2020/0047,303 Adjustable SharpenerAug 08, 18Feb 13, 20Not available
2020/0047,310 SUBSTRATE ROTATION DEVICE, SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, AND CONTROL METHOD FOR SUBSTRATE ROTATION DEVICEAug 08, 19Feb 13, 20Not available
2020/0047,269 Tool for Cutting Teeth or for Dressing of a Fine Machining Tool Having a Set of External TeethMar 06, 18Feb 13, 20Not available
2020/0047,304 AUTOMATIC MACHINE AND AUTOMATIC METHOD FOR GRINDING THE EDGES OF GLASS SHEETSOct 12, 17Feb 13, 20Not available
2020/0040,221 COMPOSITIONS FOR USE IN CHEMICAL MECHANICAL POLISHINGJul 03, 19Feb 06, 20Not available
2020/0043,773 SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD, SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING METHOD, METHOD OF REMOVING LIQUID FROM UPPER SUFACE OF WAFER TO BE POLISHED, ELASTIC FILM FOR PRESSING WAFER AGAINST POLISHING PAD, SUBSTRATE RELEASE METHOD, AND CONSTANT AMOUNT GAS SUPPLY APPARATUSAug 06, 19Feb 06, 20Not available
2020/0043,814 SYSTEMS AND METHODS FOR SUCTION PAD ASSEMBLIESJul 22, 19Feb 06, 20Not available
2020/0039,019 APPARATUS AND METHODS FOR CHEMICAL MECHANICAL POLISHINGJul 24, 19Feb 06, 20Not available
2020/0039,021 METHOD OF DOUBLE-SIDE POLISHING SEMICONDUCTOR WAFEROct 03, 17Feb 06, 20Sumco Corporation
2020/0039,027 ABRASIVE ARTICLE INCLUDING A WEAR DETECTION SENSORAug 02, 19Feb 06, 20Not available

Showing 1 to 20 of 11419 results